SCHEMBL14929439

SCHEMBL14929439

CCC(C)(C)C(=O)OCCC(=O)OC12CC3CC(CC(C3)C1O)C2

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 4/20 0.34
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13554336 0.91 EPHX2 (0.34) EPHX2MEN1KMT2A
SCHEMBL14929402 0.88 EPHX2 (0.31) EPHX2
SCHEMBL13554338 0.87 EPHX2 (0.33) EPHX2
SCHEMBL10204838 0.85 CYP17A1 (0.33) MEN1KMT2A
SCHEMBL12555072 0.84 EPHX2 (0.37) EPHX2
SCHEMBL14929420 0.81 EPHX2 (0.34) EPHX2
SCHEMBL14929419 0.80 EPHX2 (0.34) EPHX2MEN1KMT2A
SCHEMBL11926447 0.78 EPHX2 (0.31) EPHX2
SCHEMBL10087717 0.78 EPHX2 (0.31) EPHX2
SCHEMBL11926449 0.76 EPHX2 (0.34) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8790867-B2 Methods of forming photolithographic patterns by negative tone development ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-07-29 US disclosed
US-20130115559-A1 METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-05-09 US disclosed