SCHEMBL14929402

SCHEMBL14929402

CCC(C)(C)C(=O)OCC(=O)OC12CC3CC(CC(C3)C1O)C2

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.31
ALDH1A1 P00352 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10087717 0.90 EPHX2 (0.31) EPHX2ALDH1A1
SCHEMBL11926449 0.88 EPHX2 (0.34) EPHX2
SCHEMBL14929439 0.88 EPHX2 (0.34) EPHX2
SCHEMBL10204838 0.87 CYP17A1 (0.33) ALDH1A1
SCHEMBL15889448 0.86 EPHX2 (0.30) EPHX2
SCHEMBL15889342 0.84 ALDH1A1 (0.31) ALDH1A1
SCHEMBL11926448 0.84 EPHX2 (0.33) EPHX2
SCHEMBL14929559 0.81 EPHX2 (0.32) EPHX2ALDH1A1
SCHEMBL9916127 0.81 CYP19A1 (0.40) EPHX2ALDH1A1
SCHEMBL11926447 0.80 EPHX2 (0.31) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8790867-B2 Methods of forming photolithographic patterns by negative tone development ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-07-29 US disclosed
US-20130115559-A1 METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-05-09 US disclosed