⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1493113 | 1.00 | — | — | |
| SCHEMBL3693807 | 0.79 | ALDH1A1 (0.46) | — | |
| SCHEMBL3693804 | 0.79 | ALDH1A1 (0.46) | — | |
| SCHEMBL19136052 | 0.79 | ALDH1A1 (0.46) | — | |
| SCHEMBL28493470 | 0.77 | — | — | |
| SCHEMBL7764609 | 0.77 | — | — | |
| SCHEMBL2790030 | 0.72 | — | — | |
| SCHEMBL29033878 | 0.72 | — | — | |
| SCHEMBL5700648 | 0.72 | — | — | |
| SCHEMBL6054074 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2470574-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | Bridgestone Corporation (JP) | 2012-07-04 | — | — | EP | claimed |
| US-20120165484-A1 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2012-06-28 | — | — | US | claimed |
| WO-2011028523-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2011-03-10 | — | — | WO | claimed |
| US-12109812-B2 | Ink jet printing method and ink jet printing apparatus | SEIKO EPSON CORPORATION (JP) | 2024-10-08 | — | — | US | disclosed |
| US-11767388-B1 | Silicon-functionalized rubber | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 2023-09-26 | — | — | US | disclosed |
| CN-114055975-A | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2022-02-18 | — | — | CN | disclosed |
| US-20220032618-A1 | Ink Jet Printing Method And Ink Jet Printing Apparatus | SEIKO EPSON CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| US-10202535-B2 | Method for treating subterranean formations | LAMBERTI SPA (IT) | 2019-02-12 | — | — | US | disclosed |
| US-9956726-B2 | Apparatus for producing three-dimensional structure, method of producing three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20170247597-A1 | METHOD FOR TREATING SUBTERRANEAN FORMATIONS | LAMBERTI SPA (IT) | 2017-08-31 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090077798-A1 | METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090071706-A1 | METHOD FOR PRODUCING MULTILAYERED WIRING SUBSTRATE, MULTILAYERED WIRING SUBSTRATE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080317943-A1 | METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080311285-A1 | CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| US-3987061-A | METAL COMPLEXING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-10-19 | — | — | US | disclosed |