⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284795 | 0.74 | — | — | |
| SCHEMBL6556419 | 0.63 | ALDH1A1 (0.50) | — | |
| SCHEMBL538238 | 0.62 | — | — | |
| SCHEMBL2259039 | 0.60 | — | — | |
| SCHEMBL23722482 | 0.59 | ALDH1A1 (0.47) | — | |
| SCHEMBL1721841 | 0.59 | — | — | |
| SCHEMBL15547498 | 0.59 | — | — | |
| SCHEMBL875197 | 0.59 | — | — | |
| SCHEMBL1617647 | 0.59 | — | — | |
| SCHEMBL38146 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12331164-B2 | Curable siloxane resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2025-06-17 | — | — | US | claimed |
| CN-113896845-B | Low-sensitivity slow-release polycarboxylic acid slump retaining agent and preparation method thereof | 科之杰新材料集团有限公司 | 2023-07-25 | — | — | CN | claimed |
| US-20230078587-A1 | CURABLE SILOXANE RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2023-03-16 | — | — | US | claimed |
| CN-113896845-A | Low-sensitivity slow-release polycarboxylic slump retaining agent and preparation method thereof | 科之杰新材料集团有限公司 | 2022-01-07 | — | — | CN | claimed |
| EP-2470574-B1 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORP (JP) | 2014-09-17 | — | — | EP | claimed |
| US-8765887-B2 | Process and catalyst system for polydiene production | BRIDGESTONE CORPORATION (JP) | 2014-07-01 | — | — | US | claimed |
| EP-2470574-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | Bridgestone Corporation (JP) | 2012-07-04 | — | — | EP | claimed |
| US-20120165484-A1 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2012-06-28 | — | — | US | claimed |
| WO-2011028523-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2011-03-10 | — | — | WO | claimed |
| US-12331164-B2 | Curable siloxane resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2025-06-17 | — | — | US | disclosed |
| US-11767388-B1 | Silicon-functionalized rubber | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 2023-09-26 | — | — | US | disclosed |
| CN-113896845-B | Low-sensitivity slow-release polycarboxylic acid slump retaining agent and preparation method thereof | 科之杰新材料集团有限公司 | 2023-07-25 | — | — | CN | disclosed |
| US-20230078587-A1 | CURABLE SILOXANE RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2023-03-16 | — | — | US | disclosed |
| CN-113896845-A | Low-sensitivity slow-release polycarboxylic slump retaining agent and preparation method thereof | 科之杰新材料集团有限公司 | 2022-01-07 | — | — | CN | disclosed |
| WO-2011028523-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2011-03-10 | — | — | WO | disclosed |
| US-7629400-B2 | Image making medium | HYMAN SYDNEY | 2009-12-08 | — | — | US | disclosed |
| US-20030035917-A1 | Image making medium | HYMAN SYDNEY (US) | 2003-02-20 | — | — | US | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |