Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.54 |
| ▸ | MAPT | P10636 | 5/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.54 |
| ▸ | MEN1 | O00255 | 4/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | NQO1 | P15559 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | GSK3B | P49841 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | CRHBP | P24387 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.46 |
| ▸ | SCN1A | P35498 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1493247 | 1.00 | KMT2A (0.54) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL9806020 | 0.89 | NQO1 (0.64) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL12513604 | 0.86 | MAPT (0.51) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL15489413 | 0.85 | MAPT (0.53) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| Methylamine SCHEMBL27794170 | 0.85 | NQO1 (0.58) | MAPTTDP1SMN1; SMN2KDM4ELMNA | |
| SCHEMBL8762872 | 0.84 | NQO1 (0.70) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL8762877 | 0.84 | NQO1 (0.70) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL9176995 | 0.84 | GSK3B (0.63) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL11311514 | 0.84 | ALDH1A1 (0.55) | KMT2AMAPTTDP1MEN1SMN1; SMN2 | |
| SCHEMBL9176989 | 0.84 | GSK3B (0.63) | KMT2AMAPTTDP1MEN1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6379859-B2 | MIXTURE OF ALKALI SOLUBLE POLYMER AND PHOTOSENSITIZERS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-4287289-A | Photoresist cyclized rubber and bisazide compositions containing a monoazo photoextinction agent | TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) | 1981-09-01 | — | — | US | claimed |
| US-4268603-A | Photoresist compositions | TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) | 1981-05-19 | — | — | US | claimed |
| CN-118732397-A | Positive photoresist composition and method for producing resist pattern | 常州强力先端电子材料有限公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| CN-114967342-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114967343-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-107407879-B | Photosensitive resin composition, photosensitive sheet, semiconductor device, and method for manufacturing semiconductor device | 东丽株式会社 | 2020-10-16 | — | — | CN | disclosed |
| CN-106444289-B | Ultraviolet irradiation apparatus, resist pattern forming apparatus, ultraviolet irradiation method, and resist pattern forming method | 东京应化工业株式会社 | 2020-09-08 | — | — | CN | disclosed |
| US-10705425-B2 | Photosensitive resin composition, photosensitive, sheet, semiconductor device and method for manufacturing semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2020-07-07 | — | — | US | disclosed |
| CN-111285754-A | Method for purifying cresols, method for producing phenol resin for photosensitive resin composition, and photosensitive resin composition | 东京应化工业株式会社 | 2020-06-16 | — | — | CN | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |
| US-5853948-A | Positive photoresist compositions and multilayer resist materials using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5738968-A | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-04-14 | — | — | US | disclosed |
| US-5702861-A | BLEND OF ALKALI SOLUBLE RESIN, QUINONE DIAZIDE COMPOUND AND AN AROMATIC POLYHYDROXY COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| US-5702862-A | ALKALI SOLUBLE RESIN; A QUINONE DIAZIDE GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| US-4985333-A | PHOTORESISTS FOR SEMICONDUCTORS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1991-01-15 | — | — | US | disclosed |
| US-4882260-A | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | TOKYO OHKA KOGYO CO., LTD. (JP) | 1989-11-21 | — | — | US | disclosed |
| US-4287289-A | Photoresist cyclized rubber and bisazide compositions containing a monoazo photoextinction agent | TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) | 1981-09-01 | — | — | US | disclosed |
| US-4268603-A | Photoresist compositions | TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) | 1981-05-19 | — | — | US | disclosed |