SCHEMBL1493258

SCHEMBL1493258

O=C(c1ccccc1)C(c1ccccc1)C1(O)CCCCC1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.51
CHRM2 P08172 2/20 0.51
CHRM1 P11229 2/20 0.51
CHRM3 P20309 2/20 0.51
CHRM4 P08173 1/20 0.51
SMN1; SMN2 Q16637 3/20 0.50
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
CES2 O00748 1/20 0.46
CES1 P23141 1/20 0.46
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
SLC6A3 Q01959 1/20 0.42
IDO1 P14902 1/20 0.41
TDO2 P48775 1/20 0.41
ALDH1A1 P00352 5/20 0.41
HTT P42858 2/20 0.41
MITF O75030 1/20 0.41
RAB9A P51151 1/20 0.41
GFER P55789 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13628924 0.84 LMNA (0.55) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL14489601 0.84 LMNA (0.55) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL1999106 0.84 LMNA (0.55) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL628303 0.82 LMNA (0.56) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL29845505 0.82 LMNA (0.56) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL1408838 0.81 CHRM2 (0.56) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL10806353 0.81 LMNA (0.52) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL23581781 0.80 CHRM2 (0.55) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL10808122 0.79 LMNA (0.54) LMNACHRM2CHRM1CHRM3CHRM4
SCHEMBL10299132 0.79 LMNA (0.57) LMNACHRM2CHRM1CHRM3CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240308201-A1 LAMINATE AND METHOD FOR PRODUCING PRINTING PLATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-09-19 US disclosed
WO-2023248866-A1 ACTINIC-RAY-CURABLE INK COMPOSITION サカタインクス株式会社 2023-12-28 WO disclosed
WO-2023210628-A1 PHENOXY(METH)ACRYLATE RESIN, COMPOSITION, CURED OBJECT, AND METHOD FOR PRODUCING PHENOXY(METH)ACRYLATE RESIN サカタインクス株式会社 2023-11-02 WO disclosed
US-20230133371-A1 LAMINATE AND METHOD FOR PRODUCING PRINTING PLATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-05-04 US disclosed
EP-4119343-A1 LAMINATE AND METHOD FOR MANUFACTURING PRINT PLATE Asahi Kasei Kabushiki Kaisha (JP) 2023-01-18 EP disclosed
WO-2021132217-A1 RESIN COMPOSITION, RESIN COMPOSITION FOR THREE-DIMENSIONAL MODELS, AND DENTAL RESIN COMPOSITION 日本電気硝子株式会社 2021-07-01 WO disclosed
EP-1594003-B1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORP (JP) 2016-06-15 EP disclosed
US-8872063-B2 Method for producing blank printing sleeve for laser engraving ASAHI KASEI E-MATERIALS CORPORATION (JP) 2014-10-28 US disclosed
EP-2246377-B1 RESIN COMPOSITION ASAHI KASEI E MATERIALS CORP (JP) 2014-08-27 EP disclosed
EP-1710093-B1 PHOTOSENSITIVE RESIN COMPOSITION FOR LASER ENGRAVABLE PRINTING SUBSTRATE ASAHI KASEI CHEMICALS CORP (JP) 2013-11-20 EP disclosed
US-20020086161-A1 Radiation-curable compositions and cured articles SUNCOLOR CORPORATION 2002-07-04 US disclosed
EP-0957120-B1 Process of manufacture of a photo-cast molding ASAHI CHEMICAL IND (JP) 2002-04-03 EP disclosed
US-6350792-B1 Radiation-curable compositions and cured articles SUNCOLOR CORPORATION 2002-02-26 US disclosed
US-6342178-B1 FILLING MOLD CAVITY WITH PHOTOCURABLE LIQUID; IRRADIATION WITH LIGHT TO CURE; RADIATION TRANSPARENT; HIGH SPEED, SIMPLIFIED; APPLIANCES, AUTOMOBILES ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-01-29 US disclosed
WO-2002006371-A2 RADIATION-CURABLE COMPOSITIONS AND CURED ARTICLES SUNCOLOR CORPORATION (US) 2002-01-24 WO disclosed
EP-0819714-B1 Photosensitive resin composition for photo-cast-molding ASAHI CHEMICAL IND (JP) 2001-11-28 EP disclosed
US-5990190-A PHOTOSENSITIVE RESIN COMPOSITION HAVING AN ULTRAVIOLET TRANSMITTANCE OF 0.05-5% MEASURED AT A 1-MM THICKNESS; MAKING A DUPLICATE MODEL BY PRODUCING AN ULTRAVIOLET-TRANSMITTABLE SILICONE RUBBER-MADE MOLD USING A MASTER MODEL; QUICK-SETTING; ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1999-11-23 US disclosed
EP-0957120-A1 Process of manufacture of a photo-cast molding ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1999-11-17 EP disclosed
EP-0832726-A2 Replica molding Shonan Design Co., Ltd. (JP) 1998-04-01 EP disclosed
EP-0819714-A1 Photosensitive resin composition for photo-cast-molding ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1998-01-21 EP disclosed