⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2269861 | 0.79 | — | — | |
| SCHEMBL15309856 | 0.75 | EPHX1 (0.32) | — | |
| SCHEMBL2276057 | 0.71 | — | — | |
| Lithium SCHEMBL29592603 | 0.70 | — | — | |
| SCHEMBL28645213 | 0.70 | — | — | |
| SCHEMBL2273963 | 0.69 | — | — | |
| SCHEMBL235701 | 0.67 | — | — | |
| SCHEMBL235324 | 0.67 | — | — | |
| SCHEMBL25166709 | 0.64 | — | — | |
| SCHEMBL2511558 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| CN-119930872-A | Catalyst system, prepolymerized catalyst composition and olefin polymerization process | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119930869-A | Auxiliary agent for olefin polymerization, olefin catalyst system, prepolymerized catalyst composition and olefin polymerization method | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| US-20210363639-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2021-11-25 | — | — | US | claimed |
| EP-3902939-A1 | DEPOSITION OF CARBON DOPED SILICON OXIDE | Versum Materials US, LLC (US) | 2021-11-03 | — | — | EP | claimed |
| CN-113383108-A | Deposition of carbon-doped silicon oxide | 弗萨姆材料美国有限责任公司 | 2021-09-10 | — | — | CN | claimed |
| EP-3844319-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | Versum Materials US, LLC (US) | 2021-07-07 | — | — | EP | claimed |
| CN-112969816-A | Compositions for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | claimed |
| WO-2020072768-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2020-04-09 | — | — | WO | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| CN-103374708-B | High temperature atomic layer deposition of silicon oxide thin films | 气体产品与化学公司 | 2017-05-17 | — | — | CN | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| CN-103374708-A | High temperature atomic layer deposition of silicon oxide thin films | AIR PROD & CHEM | 2013-10-30 | — | — | CN | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-8034673-B2 | Film formation method and apparatus for forming silicon-containing insulating film doped with metal | TOKYO ELECTRON LIMITED (JP) | 2011-10-11 | — | — | US | claimed |
| US-20100004414-A1 | POLYMERS FUNCTIONALIZED WITH IMIDE COMPOUNDS CONTAINING A PROTECTED AMINO GROUP | BRIDGESTONE CORPORATION (JP) | 2010-01-07 | — | — | US | claimed |
| US-20090263975-A1 | FILM FORMATION METHOD AND APPARATUS FOR FORMING SILICON-CONTAINING INSULATING FILM DOPED WITH METAL | TOKYO ELECTRON LIMITED (JP) | 2009-10-22 | — | — | US | claimed |