⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2508674 | 0.72 | — | — | |
| Lithium SCHEMBL29592603 | 0.67 | — | — | |
| SCHEMBL28645213 | 0.67 | — | — | |
| SCHEMBL28709429 | 0.67 | — | — | |
| SCHEMBL149430 | 0.64 | — | — | |
| SCHEMBL9189483 | 0.62 | — | — | |
| SCHEMBL25166709 | 0.61 | — | — | |
| SCHEMBL888418 | 0.61 | TP53 (0.31) | — | |
| SCHEMBL5403964 | 0.61 | TP53 (0.31) | — | |
| Hydrochloric Acid SCHEMBL25166787 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9012133-B2 | Removal of alkaline crystal defects in lithographic patterning | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-04-21 | — | — | US | claimed |
| US-7129187-B2 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED (JP) | 2006-10-31 | — | — | US | claimed |
| WO-2006019438-A2 | LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON-NITROGEN-CONTAINING FILMS | TOKYO ELECTRON LIMITED (JP) | 2006-02-23 | — | — | WO | claimed |
| US-20060014399-A1 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED | 2006-01-19 | — | — | US | claimed |
| US-3983114-A | Method of preparation of 6-aza uracile and its O-disilyl derivative | NOBEL HOECHST CHIMIE (FR) | 1976-09-28 | — | — | US | claimed |
| JP-61281868-A | — | — | None | — | — | JP | disclosed |
| EP-4382481-A1 | HETEROATOM-DOPED NANODIAMOND PARTICLES AND METHOD FOR PRODUCING HETEROATOM-DOPED NANODIAMOND PARTICLES | Daicel Corporation (JP) | 2024-06-12 | — | — | EP | disclosed |
| CN-117794856-A | Heteroatom-doped nanodiamond particles and method for producing heteroatom-doped nanodiamond particles | 株式会社大赛璐 | 2024-03-29 | — | — | CN | disclosed |
| US-20240044722-A1 | TEMPERATURE SENSITIVE PROBE | DAICEL CORPORATION (JP) | 2024-02-08 | — | — | US | disclosed |
| EP-4269969-A1 | TEMPERATURE SENSITIVE PROBE | Daicel Corporation (JP) | 2023-11-01 | — | — | EP | disclosed |
| CN-116670501-A | Temperature sensitive probe | 株式会社大赛璐 | 2023-08-29 | — | — | CN | disclosed |
| US-20220185676-A1 | HETEROATOM-DOPED NANODIAMOND | DAICEL CORPORATION (JP) | 2022-06-16 | — | — | US | disclosed |
| US-4801468-A | ACTIVE MATERIALS, DECOMPOSITION, GERMANIUM-HALOGEN COMPOUND, DISCHARGING | CANON KABUSHIKI KAISHA (JP) | 1989-01-31 | — | — | US | disclosed |
| US-4784874-A | VAPOR DEPOSITION SEMICONDUCTOR FILMS | CANON KABUSHIKI KAISHA (JP) | 1988-11-15 | — | — | US | disclosed |
| US-4728528-A | IRRADIATION OF ACTIVE SPECIES | CANON KABUSHIKI KAISHA (JP) | 1988-03-01 | — | — | US | disclosed |
| US-4726963-A | VAPOR DEPOSITION OF DECOMPOSED GERMANIUM HALIDE AND ANOTHER ACTIVE MATERIAL | CANON KABUSHIKI KAISHA (JP) | 1988-02-23 | — | — | US | disclosed |
| US-4717585-A | Process for forming deposited film | CANON KABUSHIKI KAISHA (JP) | 1988-01-05 | — | — | US | disclosed |
| US-4716048-A | PREACTIVATION OF REACTANTS FOR CHEMICAL VAPOR DEPOSITION | CANON KABUSHIKI KAISHA (JP) | 1987-12-29 | — | — | US | disclosed |
| JP-S61281868-A | FORMATION OF DEPOSITED FILM | CANON INC | 1986-12-12 | — | — | JP | disclosed |
| US-3983114-A | Method of preparation of 6-aza uracile and its O-disilyl derivative | NOBEL HOECHST CHIMIE (FR) | 1976-09-28 | — | — | US | disclosed |