Methacrylic Acid

Methacrylic Acid

SCHEMBL14946

C=C(C)C(=O)O.C=C(C)C(=O)O.OCC(O)CO

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.47
ALDH1A1 P00352 2/20 0.47
TGFBR1 P36897 1/20 0.43
TET2 Q6N021 5/20 0.38
OR51E2 Q9H255 1/20 0.38
TET3 O43151 1/20 0.36
TET1 Q8NFU7 1/20 0.36
TDP1 Q9NUW8 2/20 0.35
SLC22A6 Q4U2R8 1/20 0.33
TSHR P16473 1/20 0.33
THRB P10828 1/20 0.33
PDE4A P27815 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL35508 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL8083949 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL29833500 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL15733068 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL11414820 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL5710041 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL35386 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL31053467 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL108430 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2
Methacrylic Acid SCHEMBL17184295 1.00 LMNA (0.47) LMNAALDH1A1TGFBR1TET2OR51E2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 10003 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6352782-B1 None US claimed
CN-121182437-B Ultraviolet light curing composition for prismatic film with transverse grain structure and preparation method thereof 上海绘兰材料科技有限公司 2026-05-15 CN claimed
CN-121559814-B Ultraviolet curing nano-imprint photoresist with semi-interpenetrating network structure and preparation method thereof 中国科学技术大学 2026-05-12 CN claimed
CN-122028617-A Display panel, preparation method thereof and display device 昆山国显光电有限公司 2026-05-12 CN claimed
US-12624174-B2 Hydrogen-bond enriched ion exchange membranes THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2026-05-12 US claimed
US-20260125513-A1 CURABLE RESIN COMPOSITIONS ILLUMINA INC (US) 2026-05-07 US claimed
EP-4378970-B1 PHOTOTHERMAL-CURING RESIN COMPOSITION, AND PREPARATION METHOD THEREFOR AND USE THEREOF AIDITE QINHUANGDAO TECH CO LTD (CN) 2026-05-06 EP claimed
US-12609352-B2 Emulsion, emulsion gel electrolyte, aerogel, as well as preparation method and use SHANDONG UNIVERSITY (CN) 2026-04-21 US claimed
WO-2026042014-A1 A PHOTOCURABLE ACRYLATE RESIN MONOMER AND THE USE THEREOF LEVOBIO LIMITED (CN) 2026-02-26 WO claimed
WO-2026043333-A1 POLYMER COMPOSITE MEMBRANE HAVING LONG-LASTING STERILIZATION AND BIOCOMPATIBILITY USING CHEMICAL VAPOR DEPOSITION, AND MANUFACTURING METHOD THEREFOR 한국과학기술원 2026-02-26 WO claimed
US-4547543-A N-METHYL-3-METHYLENE-2-PYRROLIDONE-ACRYLATE, METHACRYLATE OR STYRENE CROSSLINKED COPOLYMER TOYO CONTACT LENS CO., LTD. (JP) 1985-10-15 US claimed
US-4535102-A CARBOXYLIC MONOMER WITH UNSATURATED ESTER OR OTHER VINYL COMPOUND AND ORGANIC TITANATE AND INITIATOR TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1985-08-13 US claimed
EP-0054700-B1 COMPOSITION POLYMWRISABLE BY IRRADIATION, AND RADIATION SENSIBLE RECORDING MATERIAL PRODUCED THEREFROM HOECHST AKTIENGESELLSCHAFT (DE) 1985-02-13 EP claimed
US-4458007-A PRINTING PLATES, PHOTORESISTS HOECHST AKTIENGESELLSCHAFT (DE) 1984-07-03 US claimed
US-4293636-A HALF ESTER OF HYDROXYALKYL ACRYLATE AND POLYBASIC ACID, VINYL MONOMER TAMURA KAKEN CO., LTD. (JP) 1981-10-06 US claimed
US-4247621-A Original pattern plate obtained by use of photo-sensitive resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-01-27 US claimed
US-4140605-A PHOTOPOLYMERIZATION, MELAMINE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1979-02-20 US claimed
US-4087487-A THREE-DIMENSIONAL DIAZOTIZABLE POLYMER WITH LINEAR POLYMER HAVING BINDING LIGANDS CESKOSLOVENSKA AKADEMIE VED (CS) 1978-05-02 US claimed
US-4012559-A Radiation curable coating composition and precoated metal having top coat based on the same TORAY INDUSTRIES, INC (JA) 1977-03-15 US claimed
US-3940523-A Decorative multilayer object BERCHER S.A. PUBLICITE GENERALE (CH) 1976-02-24 US claimed