SCHEMBL149653

SCHEMBL149653

CCCCc1cc2ccccc2c(S(=O)(=O)O)c1S(=O)(=O)O

nearest known ligand 0.45

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.44
TLR8 Q9NR97 2/20 0.42
GPR84 Q9NQS5 1/20 0.41
MAPT P10636 1/20 0.40
ESR1 P03372 4/20 0.39
ESR2 Q92731 4/20 0.39
SLC2A1 P11166 3/20 0.38
ATM Q13315 1/20 0.38
GAA P10253 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2521799 0.96 MAPT (0.45) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL2522076 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL2521075 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL150438 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL2522851 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL2522842 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL2049326 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL7787213 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL7784219 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1
SCHEMBL28054823 0.94 MAPT (0.47) CYP2D6TLR8GPR84MAPTSLC2A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12415931-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12415930-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12398288-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-08-26 US disclosed
EP-4067437-B1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHINETSU CHEMICAL CO (JP) 2024-08-21 EP disclosed
CN-110016284-B Conductive polymer composition, cover and pattern forming method 信越化学工业株式会社 2023-08-08 CN disclosed
US-20230159766-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
EP-4134388-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-15 EP disclosed
CN-115397916-A Conductive polymer composition, substrate, and method for producing substrate 信越化学工业株式会社 2022-11-25 CN disclosed
US-20220332957-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-20 US disclosed
EP-4067437-A2 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE Shin-Etsu Chemical Co., Ltd. (JP) 2022-10-05 EP disclosed
EP-1947655-A1 TRANSPARENT CONDUCTIVE SHEET FOR TOUCH PANEL, METHOD FOR MANUFACTURING SAME AND TOUCH PANEL SHIN-ETSU POLYMER CO., LTD. (JP) 2008-07-23 EP disclosed
US-20080107457-A1 Image-forming apparatus FUJI XEROX CO., LTD. (JP) 2008-05-08 US disclosed
EP-1918325-A1 Conductive composition SHIN-ETSU POLYMER CO., LTD. (JP) 2008-05-07 EP disclosed
EP-1918326-A1 Conductive composition Shin-Etsu Polymer Co. Ltd. (JP) 2008-05-07 EP disclosed
US-20070096066-A1 Conductive composition, conductive coating material, conductive resin, capacitor, photoelectric transducer, and their production method SHIN-ETSU POLYMER CO., LTD. (JP) 2007-05-03 US disclosed
US-20070025740-A1 Intermediate transfer belt, production method thereof, and image-forming device using the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2007-02-01 US disclosed
EP-1634922-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE COATING MATERIAL, CONDUCTIVE RESIN, CAPACITOR, PHOTO-ELECTRIC CONVERTING ELEMENT, AND PROCESS FOR PRODUCING THE SAME SHIN-ETSU POLYMER CO., LTD. (JP) 2006-03-15 EP disclosed
US-20060047030-A1 Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium SHIN-ETSU POLYMER CO., LTD 2006-03-02 US disclosed
US-20050214554-A1 Polyimide film, image-forming apparatus, method for producing the polyimide film, and method for producing the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2005-09-29 US disclosed
US-5436796-A Polyaniline in undoped state, second polymer having ester or amide groups, protonic acid NITTO DENKO CORPORATION (JP) 1995-07-25 US disclosed