⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26359 | 0.80 | — | — | |
| SCHEMBL4060207 | 0.80 | — | — | |
| Iodide SCHEMBL19133541 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL5407487 | 0.76 | AOC1 (0.31) | — | |
| Iodide SCHEMBL19133540 | 0.74 | — | — | |
| SCHEMBL333136 | 0.66 | — | — | |
| SCHEMBL14692368 | 0.65 | CYP2D6 (0.33) | — | |
| SCHEMBL3337908 | 0.61 | — | — | |
| SCHEMBL879849 | 0.61 | — | — | |
| SCHEMBL2695678 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8975010-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-10 | — | — | US | disclosed |
| US-8956800-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20130177853-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-11 | — | — | US | disclosed |
| US-20130164693-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-20130137047-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |