SCHEMBL14977988

SCHEMBL14977988

CCC(C)(C)CC(C(=O)OCC(=O)OCC(F)(F)F)C(C)(C)C

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14817262 0.90 HTT (0.35) HTT
SCHEMBL14533301 0.89 HTT (0.46) HTT
SCHEMBL13558163 0.89 FGFR1 (0.33)
SCHEMBL16572672 0.86 HTT (0.39) HTT
SCHEMBL12649512 0.86
SCHEMBL18924494 0.85 HTT (0.38) HTT
SCHEMBL13181072 0.84 HTT (0.35) HTT
SCHEMBL13180295 0.83 HTT (0.34) HTT
SCHEMBL10330898 0.81
SCHEMBL13180293 0.81 HTT (0.33) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846838-B2 Fluorine-containing block copolymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2014-09-30 US disclosed
US-8450044-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-28 US disclosed
US-20130053518-A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-02-28 US disclosed