⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21970792 | 0.90 | — | — | |
| SCHEMBL14983542 | 0.83 | — | — | |
| SCHEMBL14983543 | 0.79 | CYP2D6 (0.34) | — | |
| SCHEMBL2424327 | 0.75 | ATM (0.34) | — | |
| SCHEMBL4849535 | 0.75 | CHRNB2 (0.40) | — | |
| SCHEMBL2419169 | 0.75 | HCAR2 (0.33) | — | |
| SCHEMBL2417632 | 0.74 | CHRNB2 (0.37) | — | |
| SCHEMBL14983544 | 0.73 | ERN1 (0.30) | — | |
| SCHEMBL14983467 | 0.73 | KMT2A (0.35) | — | |
| SCHEMBL2417143 | 0.72 | CYP11B1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3312172-B1 | AMINOPYRAZOLE DERIVATIVES USEFUL AS SRC KINASE INHIBITORS | CHUGAI PHARMACEUTICAL CO LTD (JP) | 2020-05-06 | — | — | EP | disclosed |
| US-10504732-B2 | Impurity diffusion agent composition and method for manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO, LTD. (JP) | 2019-12-10 | — | — | US | disclosed |
| US-20180182624-A1 | IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180182624-A1 | IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-8945820-B2 | Silicon-containing resist underlayer film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8945820-B2 | Silicon-containing resist underlayer film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |