Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14984070 | 0.88 | — | — | |
| SCHEMBL14984069 | 0.86 | CYP17A1 (0.33) | CYP19A1CYP17A1 | |
| SCHEMBL47414 | 0.85 | CYP17A1 (0.32) | CYP19A1CYP17A1 | |
| SCHEMBL47452 | 0.84 | CYP19A1 (0.35) | CYP19A1CYP17A1 | |
| SCHEMBL14984085 | 0.81 | SCN1A (0.32) | — | |
| SCHEMBL14984084 | 0.80 | SCN1A (0.32) | — | |
| SCHEMBL47397 | 0.78 | CYP19A1 (0.48) | CYP19A1CYP17A1 | |
| SCHEMBL14984086 | 0.78 | — | — | |
| SCHEMBL16675481 | 0.77 | CYP3A4 (0.33) | — | |
| SCHEMBL14883940 | 0.77 | CYP17A1 (0.37) | CYP19A1CYP17A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9164380-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9063416-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-8883396-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8785106-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-22 | — | — | US | disclosed |
| US-20130224658-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130189619-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130157197-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130137048-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |