Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23012599 | 0.84 | TSHR (0.46) | TSHRALDH1A1THRB | |
| SCHEMBL15169700 | 0.81 | — | — | |
| SCHEMBL1875886 | 0.79 | TSHR (0.42) | TSHRALDH1A1THRBTGFBR1 | |
| SCHEMBL18233423 | 0.76 | TSHR (0.47) | TSHRALDH1A1THRB | |
| SCHEMBL25561391 | 0.76 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL14351306 | 0.75 | TSHR (0.33) | TSHRALDH1A1 | |
| SCHEMBL9705811 | 0.74 | TSHR (0.46) | TSHRALDH1A1THRB | |
| SCHEMBL49067 | 0.73 | TSHR (0.48) | TSHRALDH1A1THRBTGFBR1 | |
| SCHEMBL35547 | 0.72 | TSHR (0.52) | TSHRALDH1A1THRBTGFBR1 | |
| SCHEMBL22231290 | 0.72 | TSHR (0.42) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1464659-B1 | Process for preparing stable polymer concentrates | CLARIANT PRODUKTE DEUTSCHLAND (DE) | 2010-10-06 | — | — | EP | claimed |
| US-20040260010-A1 | Process for the preparation of stable polymer concentrates | CLARIANT GMBH | 2004-12-23 | — | — | US | claimed |
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| US-20190049780-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF THE SAME, BLACK MATRIX, PIXEL LAYER, PROTECTION FILM, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS | CHI MEI CORPORATION (TW) | 2019-02-14 | — | — | US | disclosed |
| US-10088612-B2 | Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof | CHI MEI CORPORATION (TW) | 2018-10-02 | — | — | US | disclosed |
| US-9939568-B2 | Photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2018-04-10 | — | — | US | disclosed |
| US-20180004086-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2018-01-04 | — | — | US | disclosed |
| US-9791773-B2 | Photosensitive resin composition, color filter and liquid crystal display device | CHI MEI CORPORATION (TW) | 2017-10-17 | — | — | US | disclosed |
| US-20170235224-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF | CHI MEI CORPORATION (TW) | 2017-08-17 | — | — | US | disclosed |
| US-9568823-B2 | Photosensitive resin composition for color filter and uses thereof | CHI MEI CORPORATION (TW) | 2017-02-14 | — | — | US | disclosed |
| US-9568763-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-02-14 | — | — | US | disclosed |
| US-20080220372-A1 | Photosensitive resin composition for black matrix | CHI-MEI CORP. (TW) | 2008-09-11 | — | — | US | disclosed |
| US-20070238047-A1 | Photosensitive resin composition for color filters | CHI-MEI CORPORATION | 2007-10-11 | — | — | US | disclosed |
| US-20070117876-A1 | Photosensitive resin composition for black matrix | CHI-MEI CORPORATION | 2007-05-24 | — | — | US | disclosed |
| US-20060166114-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2006-07-27 | — | — | US | disclosed |
| US-7033733-B2 | Photosensitive resin composition for color filters | CHI MEI CORPORATION (TW) | 2006-04-25 | — | — | US | disclosed |
| US-20050175930-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-08-11 | — | — | US | disclosed |
| US-20050158659-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-07-21 | — | — | US | disclosed |
| US-20040260010-A1 | Process for the preparation of stable polymer concentrates | CLARIANT GMBH | 2004-12-23 | — | — | US | disclosed |
| US-20040191671-A1 | Photosensitive resin composition for color filters | CHI MEI CORPORATION (TW) | 2004-09-30 | — | — | US | disclosed |