SCHEMBL15024850

SCHEMBL15024850

CC(=O)OC(COCCN1CCOCC1)CC(F)(F)C(F)(F)CCC(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.36
SMN1; SMN2 Q16637 2/20 0.34
ALDH1A1 P00352 4/20 0.33
ABHD6 Q9BV23 1/20 0.33
HPGD P15428 1/20 0.33
TDP1 Q9NUW8 2/20 0.32
EPHX2 P34913 2/20 0.32
ACACB O00763 1/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
OPRM1 P35372 1/20 0.32
KCNH2 Q12809 1/20 0.32
SIGMAR1 Q99720 1/20 0.32
GAA P10253 1/20 0.32
PAOX Q6QHF9 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15025255 0.93 KDM4E (0.34) KDM4ESMN1; SMN2ALDH1A1ABHD6HPGD
SCHEMBL15025119 0.88 KDM4E (0.33) KDM4ESMN1; SMN2ALDH1A1ABHD6HPGD
SCHEMBL4810424 0.88 KDM4E (0.37) KDM4ESMN1; SMN2ALDH1A1ABHD6HPGD
SCHEMBL15024861 0.88 KDM4E (0.37) KDM4ESMN1; SMN2ALDH1A1ABHD6HPGD
SCHEMBL15025360 0.80 USP2 (0.35) KDM4ESMN1; SMN2ALDH1A1ABHD6EPHX2
SCHEMBL15014706 0.79 KDM4E (0.46) KDM4ESMN1; SMN2ALDH1A1HPGDTDP1
SCHEMBL15024854 0.77 KDM4E (0.36) KDM4ESMN1; SMN2ALDH1A1ABHD6HPGD
SCHEMBL15024853 0.77 TLR2 (0.38) KDM4ESMN1; SMN2ALDH1A1ABHD6KMT2A
SCHEMBL15025257 0.74 TLR2 (0.46) KDM4EALDH1A1KMT2A
SCHEMBL15025396 0.73 USP2 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9158191-B2 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-13 US disclosed
US-20130149493-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-13 US disclosed