Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.34 |
| ▸ | ABHD6 | Q9BV23 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.30 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.30 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15025119 | 0.93 | KDM4E (0.33) | KDM4EABHD6SMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL15024850 | 0.93 | KDM4E (0.36) | KDM4EABHD6SMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL15024861 | 0.86 | KDM4E (0.37) | KDM4EABHD6SMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL4810424 | 0.86 | KDM4E (0.37) | KDM4EABHD6SMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL15025396 | 0.82 | USP2 (0.31) | ALDH1A1 | |
| SCHEMBL15024854 | 0.76 | KDM4E (0.36) | KDM4EABHD6SMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL13980440 | 0.75 | ALDH1A1 (0.38) | KDM4ESMN1; SMN2ALDH1A1 | |
| SCHEMBL15024852 | 0.75 | USP2 (0.31) | — | |
| SCHEMBL15024853 | 0.75 | TLR2 (0.38) | KDM4EABHD6SMN1; SMN2ALDH1A1KCNH2 | |
| SCHEMBL15014706 | 0.75 | KDM4E (0.46) | KDM4ESMN1; SMN2ALDH1A1HPGDKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |