Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.77 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.72 |
| ▸ | TSHR | P16473 | 3/20 | 0.72 |
| ▸ | NT5E | P21589 | 1/20 | 0.72 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.71 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.62 |
| ▸ | POLB | P06746 | 1/20 | 0.56 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | LCK | P06239 | 1/20 | 0.43 |
| ▸ | FYN | P06241 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | CA7 | P43166 | 1/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1538013 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| Ammonia Solution, Strong SCHEMBL27367283 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL28934870 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL20421629 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL5014792 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL28935010 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL28310262 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL545629 | 0.96 | LMNA (0.72) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL28313809 | 0.93 | LMNA (0.68) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 | |
| SCHEMBL8372514 | 0.90 | LMNA (0.65) | LMNAALDH1A1TSHRNT5ESMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3186 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12405533-B2 | Resist underlayer film-forming composition containing substituted crosslinkable compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2025-09-02 | — | — | US | claimed |
| US-12371444-B2 | Methods of making MOFs, systems for synthesizing MOFs, and methods of coating textiles with MOFs | UNIVERSITY OF VIRGINIA PATENT FOUNDATION (US) | 2025-07-29 | — | — | US | claimed |
| EP-4536682-A2 | ANTIBODY REPURPOSING | SRI International (US) | 2025-04-16 | — | — | EP | claimed |
| CN-119708343-A | Disulfonate hydrophobically associating polymer oil displacement agent with cyclic structure and preparation method thereof | 河北石油职业技术大学 | 2025-03-28 | — | — | CN | claimed |
| CN-119133639-B | Carbonate-based hydrogen ion battery and preparation method thereof | 德之昭科技(苏州)有限公司 | 2025-03-04 | — | — | CN | claimed |
| US-12221745-B2 | Methods of using a phenolic fatty acid compound on a synthetic fabric material | SI GROUP, INC. (US) | 2025-02-11 | — | — | US | claimed |
| US-20250043046-A1 | POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-02-06 | — | — | US | claimed |
| CN-119264349-A | Ionic liquid modified phenolic resin and application thereof as rubber auxiliary agent | 圣奥化学科技有限公司 | 2025-01-07 | — | — | CN | claimed |
| CN-119133639-A | Carbonate-based hydrogen ion battery and preparation method thereof | 德之昭科技(苏州)有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-119101201-A | Diene compound modified alkyl phenolic resin and application thereof as tackifying resin | 圣奥化学科技有限公司 | 2024-12-10 | — | — | CN | claimed |
| US-4840862-A | HIGH SENSITIVITY AND STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 1989-06-20 | — | — | US | claimed |
| EP-0047992-B1 | PROCESS FOR THE PRODUCTION OF SYNTHETIC RESINS ON THE BASIS OF RESORCIN COMPOUNDS | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-02-26 | — | — | EP | claimed |
| EP-0061444-B1 | METHOD FOR REMOVING HYDROGEN SULFIDE FROM GAS STREAMS | UNION OIL COMPANY OF CALIFORNIA (US) | 1985-05-22 | — | — | EP | claimed |
| US-4504576-A | CATIONIC SETTING AGENT, SIZING ANTIFOGGING AGENTS | FELIX SCHOELLER JR. GMBH & CO., KG (DE) | 1985-03-12 | — | — | US | claimed |
| US-4405808-A | FROM ACETIC ACID AND OLEFIN IN PRESENCE OF STEAM AND AROMATIC DISULFONIC ACID CATALYST | NIPPON GOHSEI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1983-09-20 | — | — | US | claimed |
| US-4350800-A | Process for the preparation of synthetic resins based on resorcinol compounds | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-09-21 | — | — | US | claimed |
| US-4281176-A | ESTERIFICATION OF ETHYLENE WITH A CARBOXYLIC ACID IN THE PRESENCE OF AN ACID CATALYST | RHONE-POULENC INDUSTRIES (FR) | 1981-07-28 | — | — | US | claimed |
| EP-0003205-B1 | PROCESS FOR THE PREPARATION OF ETHYLESTERS | RHONE-POULENC INDUSTRIES (FR) | 1981-03-25 | — | — | EP | claimed |
| US-4171459-A | Manufacture of α-naphthol | BASF AKTIENGESELLSCHAFT (DE) | 1979-10-16 | — | — | US | claimed |
| US-4134412-A | WATER SOLUBLE FILM-FORMING SALT | WELLA AKTIENGESELLSCHAFT (DE) | 1979-01-16 | — | — | US | claimed |