Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.32 |
| ▸ | HRH1 | P35367 | 1/20 | 0.32 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.32 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13220839 | 0.85 | ALDH1A1 (0.30) | ALDH1A1TSHR | |
| SCHEMBL22200163 | 0.83 | ESR1 (0.41) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL28869260 | 0.79 | ESR1 (0.38) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL17831222 | 0.78 | NR1H2 (0.38) | NR1H2NR1H3 | |
| SCHEMBL15166741 | 0.78 | ESR1 (0.41) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL1203911 | 0.78 | ESR1 (0.41) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL26361047 | 0.77 | KMT2A (0.39) | ESR1ESR2SMN1; SMN2MEN1HTT | |
| SCHEMBL29552450 | 0.77 | TAAR1 (0.38) | ESR1ESR2ALDH1A1TSHRMAPT | |
| SCHEMBL20499845 | 0.75 | MAPT (0.36) | ESR1ESR2ALDH1A1TSHRSLC6A2 | |
| SCHEMBL1526078 | 0.75 | ESR1 (0.35) | ESR1ESR2ALDH1A1TSHRKCNN4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11862471-B2 | Manufacturing method for semiconductor device | KIOXIA CORPORATION (JP) | 2024-01-02 | — | — | US | claimed |
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | claimed |
| US-20220238345-A1 | MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | KIOXIA CORPORATION (JP) | 2022-07-28 | — | — | US | claimed |
| US-20220189767-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2022-06-16 | — | — | US | claimed |
| US-11081337-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | Versum Materials U.S., LLC (US) | 2021-08-03 | — | — | US | claimed |
| CN-110573651-A | Novel formulations for the deposition of silicon-doped hafnium oxide as ferroelectric material | 弗萨姆材料美国有限责任公司 | 2019-12-13 | — | — | CN | claimed |
| WO-2018170126-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-20180269057-A1 | Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | US | claimed |
| US-9460912-B2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-04 | — | — | US | claimed |
| US-6743737-B2 | FORMING INTEGRATED CIRCUITS; PLASMA VAPOR DEPOSITION | APPLIED MATERIALS, INC. | 2004-06-01 | — | — | US | claimed |
| US-20030054667-A1 | Method of improving moisture resistance of low dielectric constant films | APPLIED MATERIALS, INC. | 2003-03-20 | — | — | US | claimed |
| US-6448187-B2 | DEPOSITING A SILICON OXIDE FILM BY OXIDATION OF SILICON COMPOUND, EXPOSING TO WATER OR A HYDROPHOBIC-IMPARTING SURFACTANT SUCH AS HEXAMETHYLDISILAZANE AND CURING | APPLIED MATERIALS, INC. | 2002-09-10 | — | — | US | claimed |
| US-20010026849-A1 | Method of improving moisture resistance of low dielectric constant films | APPLIED MATERIALS, INC. | 2001-10-04 | — | — | US | claimed |
| US-6245690-B1 | EXPOSING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED FILM OF OXIDIZED ORGANOSILICON COMPOUND TO A HYDROPHOBIC-IMPARTING SURFACTANT SUCH AS HEXAMETHYLDISILAZANE PRIOR TO THERMALLY CURING TO CONTROL CARBON CONTENT IN DEPOSITED FILM | APPLIED MATERIALS, INC. | 2001-06-12 | — | — | US | claimed |
| US-11965111-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-04-23 | — | — | US | disclosed |
| US-11862471-B2 | Manufacturing method for semiconductor device | KIOXIA CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | disclosed |
| US-3933898-A | ANTIULCER, ANTICOAGULANTS, NASAL PATENCY, LABOR INDUCERS, WOUND HEALING | THE UPJOHN COMPANY (US) | 1976-01-20 | — | — | US | disclosed |
| US-3933897-A | ANTIULCER, ASTHMA, RENAL DYSFUNCTION | THE UPJOHN COMPANY (US) | 1976-01-20 | — | — | US | disclosed |
| US-3933895-A | PROSTAGLANDINS, ANTIULCER, ANTICOAGULANTS, NASAL PATENCY, LABOR INDUCERS, WOUND HEALING | THE UPJOHN COMPANY (US) | 1976-01-20 | — | — | US | disclosed |