Salicylic Acid

Salicylic Acid

SCHEMBL1503600

O=C(O)c1ccccc1O.[KH]

nearest known ligand 0.95

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHE

The experimentally established mechanism targets of Salicylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.95
KDM4E B2RXH2 6/20 0.95
HPGD P15428 6/20 0.95
SMN1; SMN2 Q16637 2/20 0.95
CA12 O43570 2/20 0.95
CA1 P00915 2/20 0.95
CA2 P00918 2/20 0.95
CA7 P43166 2/20 0.95
CA9 Q16790 2/20 0.95
CA14 Q9ULX7 2/20 0.95
HMGB1 P09429 1/20 0.95
CA4 P22748 1/20 0.95
CA6 P23280 1/20 0.95
NAPRT Q6XQN6 1/20 0.95
ALOX15 P16050 2/20 0.65
HSD17B10 Q99714 4/20 0.59
MAPT P10636 3/20 0.58
TSHR P16473 2/20 0.58
G6PD P11413 1/20 0.58
CASP7 P55210 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Salicylic Acid SCHEMBL458274 1.00 ALDH1A1 (0.95) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL28994908 1.00 ALDH1A1 (0.95) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL28814248 0.97 ALDH1A1 (0.90) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL27691236 0.97 ALDH1A1 (0.90) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL29362663 0.97 ALDH1A1 (1.00) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL29360246 0.97 ALDH1A1 (1.00) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL29606432 0.97 ALDH1A1 (1.00) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL17156443 0.97 ALDH1A1 (1.00) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL1509155 0.97 ALDH1A1 (1.00) ALDH1A1KDM4EHPGDSMN1; SMN2CA12
Salicylic Acid SCHEMBL1967 0.97 ALDH1A1 (1.00) ALDH1A1KDM4EHPGDSMN1; SMN2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 636 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12516421-B2 Barrier chemical mechanical planarization slurries for cobalt films VERSUM MATERIALS US, LLC (US) 2026-01-06 US claimed
US-20210301405-A1 Barrier Chemical Mechanical Planarization Slurries For Cobalt Films VERSUM MATERIALS US, LLC (US) 2021-09-30 US claimed
CN-103502224-A Flumazenil complexes, compositions comprising same and uses thereof COERULEUS LTD 2014-01-08 CN claimed
CN-102011771-B Fluid drag reduction composition GUANGYANG CHEN 2012-11-28 CN claimed
CN-102011771-A Fluid drag reduction composition GUANGYANG CHEN 2011-04-13 CN claimed
US-20060153935-A1 Stabilizing salicylate compositions and method of preparation for oral and topical use BLAHUT NATALIE 2006-07-13 US claimed
US-RE38576-E1 Stabilized aspirin compositions and method of preparation for oral and topical use BLAHUT NATALIE 2004-08-31 US claimed
US-RE38443-E1 Stabilized aspirin compositions and method of preparation of oral and topical use BLAHUT NATALIE 2004-02-24 US claimed
US-6248731-B1 FORMATION OF POTASSIUM SALICYLIC ACID OR POTASSIUM ACETYLSALICYLIC ACID SALT BY REACTION WITH POTASSIUM HYDROXIDE IN AN AQUEOUS SOLUTION, THEN DEHYDRATING SALT BLAHUT NATALIE (US) 2001-06-19 US claimed
US-6177413-B1 DISSOLVING SALICYLIC ACID AND ACETYLSALICYLIC ACID IN AQUEOUS POTASSIUM HYDROXIDE, DRYING, MIXING THE SALT WITH A LIQUID CARRIER BLAHUT NATALIE (US) 2001-01-23 US claimed
US-12516421-B2 Barrier chemical mechanical planarization slurries for cobalt films VERSUM MATERIALS US, LLC (US) 2026-01-06 US disclosed
WO-2024143209-A1 METHOD FOR PRODUCING MULTILAYER BODY, PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143212-A1 METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR MEMBER, AND RESIN COMPOSITION 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143210-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143211-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
EP-0255726-A2 Method for processing a silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1988-02-10 EP disclosed
EP-0254280-A2 Method for processing silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1988-01-27 EP disclosed
EP-0254294-A2 Method of processing a silver halide color photographic material and a color developer FUJI PHOTO FILM CO., LTD. (JP) 1988-01-27 EP disclosed
EP-0246624-A2 Method of forming a color image FUJI PHOTO FILM CO., LTD. (JP) 1987-11-25 EP disclosed
US-4218292-A Bright zinc electroplating bath and method MCGEAN CHEMICAL COMPANY, INC. (US) 1980-08-19 US disclosed