Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 1/20 | 0.53 |
| ▸ | DGKA | P23743 | 1/20 | 0.47 |
| ▸ | THRA | P10827 | 10/20 | 0.40 |
| ▸ | THRB | P10828 | 9/20 | 0.40 |
| ▸ | PAM | P19021 | 2/20 | 0.38 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.37 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.37 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12088219 | 0.86 | DNM1 (0.60) | DNM1DGKATHRATHRBPAM | |
| SCHEMBL12088124 | 0.82 | DNM1 (0.61) | DNM1DGKATHRATHRBPAM | |
| SCHEMBL12088191 | 0.82 | DNM1 (0.61) | DNM1DGKATHRATHRBPAM | |
| SCHEMBL12088123 | 0.82 | DNM1 (0.65) | DNM1DGKATHRATHRBPAM | |
| SCHEMBL12088266 | 0.81 | DNM1 (0.57) | DNM1DGKATHRATHRB | |
| SCHEMBL9746067 | 0.75 | DNM1 (0.54) | DNM1DGKAPAM | |
| SCHEMBL9744886 | 0.73 | DNM1 (0.49) | DNM1DGKATHRATHRBPRSS1 | |
| SCHEMBL17401279 | 0.73 | DNM1 (0.83) | DNM1DGKAPAMPRSS1PRSS2 | |
| SCHEMBL17401275 | 0.73 | DNM1 (0.83) | DNM1DGKAPAMPRSS1PRSS2 | |
| SCHEMBL17401274 | 0.73 | DNM1 (0.83) | DNM1DGKAPAMPRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |