SCHEMBL15045978

SCHEMBL15045978

COC(=O)CC1(COC(C)(C)C)CC2C=CC1C2

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14531157 0.82 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL15043190 0.79 CYP2D6 (0.40) CYP2D6CYP2C19
SCHEMBL5837900 0.74 CYP2D6 (0.31) CYP2D6CYP2C19
SCHEMBL4270319 0.73 CYP2D6 (0.36) CYP2D6CYP2C19
SCHEMBL13526437 0.72 CYP2D6 (0.36) CYP2D6CYP2C19
SCHEMBL14590445 0.71 CYP2D6 (0.33) CYP2D6CYP2C19
SCHEMBL5837137 0.71 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL5836559 0.71 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL15043230 0.69 CYP2D6 (0.30) CYP2D6CYP2C19
SCHEMBL3089606 0.69 CYP2D6 (0.33) CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 US disclosed