⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3537892 | 1.00 | — | — | |
| SCHEMBL8973129 | 0.97 | CXCR4 (0.44) | — | |
| SCHEMBL19672798 | 0.89 | — | — | |
| SCHEMBL22444413 | 0.82 | — | — | |
| SCHEMBL24671501 | 0.80 | GBA1 (0.41) | — | |
| Pivalate SCHEMBL27958702 | 0.80 | SIGMAR1 (0.45) | — | |
| SCHEMBL8373240 | 0.77 | POLB (0.50) | — | |
| SCHEMBL361682 | 0.77 | — | — | |
| SCHEMBL1194 | 0.77 | — | — | |
| SCHEMBL1162405 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 564 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115646137-B | Organic amine desulfurizing agent capable of effectively reducing foaming problem | 北京北大先锋科技股份有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-118239923-A | Compounds useful as inhibitors of factor XIIa, pharmaceutical compositions and uses thereof | 合肥工业大学 | 2024-06-25 | — | — | CN | claimed |
| CN-115646137-A | Organic amine desulfurizer capable of effectively reducing foaming problem | 北京北大先锋科技股份有限公司 | 2023-01-31 | — | — | CN | claimed |
| CN-109806864-B | High-stability catalyst for preparing chlorine by oxidizing hydrogen chloride | 西安近代化学研究所 | 2022-03-15 | — | — | CN | claimed |
| CN-106866508-B | A kind of method that catalysis oxidation heteroaromatic primary alconol prepares heteroaromatic aldehyde | 大连理工大学 | 2019-04-23 | — | — | CN | claimed |
| CN-106810513-A | A kind of preparation method of bridged piperazine derivatives | 湖南华腾制药有限公司 | 2017-06-09 | — | — | CN | claimed |
| US-9476019-B2 | Cleaning agent for semiconductor provided with metal wiring | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2016-10-25 | — | — | US | claimed |
| EP-2970328-A1 | NOVEL INHIBITOR COMPOUNDS OF PHOSPHODIESTERASE TYPE 10A | AbbVie Deutschland GmbH & Co. KG (DE) | 2016-01-20 | — | — | EP | claimed |
| US-9200005-B2 | Inhibitor compounds of phosphodiesterase type 10A | AbbVie Deutschland GmbH & Co. KG (DE) | 2015-12-01 | — | — | US | claimed |
| US-20150259632-A1 | CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2015-09-17 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| CN-101398639-A | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO LTD (KR) | 2009-04-01 | — | — | CN | claimed |
| US-6638694-B2 | Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2003-10-28 | — | — | US | claimed |
| US-20030186175-A1 | RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME | IKEMOTO KAZUTO (JP) | 2003-10-02 | — | — | US | claimed |
| EP-1272901-A1 | PHOTOIMAGEABLE, AQUEOUS ACID SOLUBLE POLYIMIDE POLYMERS | 3M Innovative Properties Company (US) | 2003-01-08 | — | — | EP | claimed |
| US-20020086236-A1 | Photoimageable, aqueous acid soluble polyimide polymers | 3M INNOVATIVE PROPERTIES COMPANY | 2002-07-04 | — | — | US | claimed |
| US-6379865-B1 | PROTECTIVE COATINGS DEPOSITED BY ELECTROPHORESIS; HIGH ELECTRICAL RESISTANCE; | 3M INNOVATIVE PROPERTIES COMPANY | 2002-04-30 | — | — | US | claimed |
| WO-2001077753-A1 | PHOTOIMAGEABLE, AQUEOUS ACID SOLUBLE POLYIMIDE POLYMERS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2001-10-18 | — | — | WO | claimed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | claimed |
| US-4781846-A | HYDROXYALKYL PIPERAZINE BACTERICIDE | IDEMITSU KOSAN LIMITED (JP) | 1988-11-01 | — | — | US | claimed |