Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 16/20 | 0.49 |
| ▸ | ESR1 | P03372 | 3/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27192920 | 0.88 | ERN1 (0.45) | ERN1ESR1ESR2 | |
| SCHEMBL3905421 | 0.83 | ERN1 (0.69) | ERN1 | |
| SCHEMBL4190794 | 0.83 | ESR1 (0.44) | ERN1ESR1ESR2 | |
| SCHEMBL30393816 | 0.83 | ERN1 (0.69) | ERN1 | |
| SCHEMBL29137501 | 0.80 | ERN1 (0.40) | ERN1ESR1ESR2 | |
| SCHEMBL3447841 | 0.79 | ERN1 (0.42) | ERN1 | |
| SCHEMBL17654724 | 0.76 | ESR1 (0.49) | ERN1ESR1ESR2 | |
| SCHEMBL8989547 | 0.76 | ERN1 (0.46) | ERN1ESR1ESR2 | |
| SCHEMBL30067092 | 0.76 | ERN1 (0.46) | ERN1ESR1ESR2 | |
| SCHEMBL29956684 | 0.76 | ERN1 (0.44) | ERN1ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118496125-A | Two-photon fluorescent probe capable of detecting acetylcholinesterase as well as preparation method and application thereof | 湖州科元生物科技有限公司 | 2024-08-16 | — | — | CN | claimed |
| CN-119638588-A | Trifluoromethyl benzyl ether substituted amino acid derivative, preparation method and application thereof | 中国医学科学院药物研究所 | 2025-03-18 | — | — | CN | disclosed |
| CN-112679321-B | New green method for preparing 1-diaryl methyl substituted-2-naphthol compound | 湖南理工学院 | 2023-08-08 | — | — | CN | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |