SCHEMBL15067231

SCHEMBL15067231

CCO[Si](OCC)(OCC)c1ccc2cc([Si](OCC)(OCC)OCC)ccc2c1

nearest known ligand 0.33

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NQO1 P15559 1/20 0.33
CYP1A2 P05177 2/20 0.31
CYP2A6 P11509 1/20 0.31
CYP11B1 P15538 2/20 0.31
CYP11B2 P19099 2/20 0.31
NCF1 P14598 2/20 0.31
CYP19A1 P11511 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA4 P22748 1/20 0.31
CA6 P23280 1/20 0.31
CA5A P35218 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
CA5B Q9Y2D0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4349511 0.96 NQO1 (0.31) NQO1
SCHEMBL2349220 0.92 CYP2A6 (0.44) CYP1A2CYP2A6
SCHEMBL29895562 0.92 CYP2A6 (0.44) CYP1A2CYP2A6
SCHEMBL14267378 0.90 CYP2A6 (0.38) CYP1A2CYP2A6
SCHEMBL4585250 0.90 CYP2A6 (0.38) CYP1A2CYP2A6
SCHEMBL14267373 0.90 CYP2A6 (0.38) CYP1A2CYP2A6
SCHEMBL4584709 0.90 CYP2A6 (0.38) CYP1A2CYP2A6
SCHEMBL14437796 0.87
SCHEMBL14437797 0.87
SCHEMBL4585529 0.87 CYP1A2 (0.45) CYP1A2CYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3430100-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2019-01-23 EP claimed
WO-2017160509-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2017-09-21 WO claimed
US-20170260419-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. 2017-09-14 US claimed
US-20150011787-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES ENI S.P.A. (IT) 2015-01-08 US claimed
EP-2797841-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES ENI S.p.A. (IT) 2014-11-05 EP claimed
WO-2013098261-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES ENI S.P.A. (IT) 2013-07-04 WO claimed
US-20250257239-A1 POLYSILOXANE COMPOSITIONS FOR OPTOELECTRONIC DEVICE APPLICATIONS INVOLVING MOISTURE SENSITIVE LAYERS SOLSTICE ADVANCED MATERIALS US, INC. 2025-08-14 US disclosed
US-11015082-B2 Crack-resistant polysiloxane dielectric planarizing compositions, methods and films HONEYWELL INTERNATIONAL INC. (US) 2021-05-25 US disclosed
EP-3728500-A1 CRACK-RESISTANT POLYSILOXANE DIELECTRIC PLANARIZING COMPOSITIONS, METHODS AND FILMS Honeywell International Inc. (US) 2020-10-28 EP disclosed
US-20190185709-A1 CRACK-RESISTANT POLYSILOXANE DIELECTRIC PLANARIZING COMPOSITIONS, METHODS AND FILMS SOLSTICE ADVANCED MATERIALS US, INC. 2019-06-20 US disclosed
EP-3430100-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2019-01-23 EP disclosed
EP-3430100-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2019-01-23 EP disclosed
WO-2017160509-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2017-09-21 WO disclosed
WO-2017160509-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2017-09-21 WO disclosed
US-20170260419-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. 2017-09-14 US disclosed
US-20150011787-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES ENI S.P.A. (IT) 2015-01-08 US disclosed
EP-2797841-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES ENI S.p.A. (IT) 2014-11-05 EP disclosed
WO-2013098261-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES ENI S.P.A. (IT) 2013-07-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150011787-A1 PROCESS FOR PREPARING ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES WITH AN ORDERED STRUCTURE AND NEW HYBRID SILICATES AND METAL-SILICATES DIS3, EDF1, CA4 NQO1 4139/4885CYP1A2 2102/4885CYP2A6 3230/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.