Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Dimethyl Fumarate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 known ✓ | Q14145 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.41 |
| ▸ | TYR | P14679 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.39 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.39 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.38 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.38 |
| ▸ | TTR | P02766 | 1/20 | 0.38 |
| ▸ | APP | P05067 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethyl Maleate SCHEMBL1506758 | 1.00 | ALDH1A1 (0.42) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL394001 | 0.89 | CA1 (0.49) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL7423972 | 0.85 | CA12 (0.58) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL7423966 | 0.85 | CA12 (0.58) | ALDH1A1CA1CA2CA12CA9 | |
| 4-Vinylphenol SCHEMBL6903536 | 0.83 | MIF (0.47) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL2616160 | 0.81 | CA12 (0.46) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL181754 | 0.77 | ALDH1A1 (0.68) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL24948275 | 0.76 | ALDH1A1 (0.41) | ALDH1A1CA1CA2CA12CA9 | |
| 4-Vinylphenol SCHEMBL6906207 | 0.76 | MIF (0.41) | ALDH1A1CA1CA2CA12CA9 | |
| SCHEMBL11858178 | 0.76 | CA1 (0.51) | ALDH1A1CA1CA2CA12CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7449573-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| EP-1662317-A2 | Resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-05-31 | — | — | EP | disclosed |
| US-20060068320-A1 | Resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2006-03-30 | — | — | US | disclosed |
| US-20060040203-A1 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |
| US-6902862-B2 | Resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20040058272-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-25 | — | — | US | disclosed |