⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Potassium Ion SCHEMBL35667 | 0.86 | — | — | |
| SCHEMBL7132259 | 0.86 | — | — | |
| SCHEMBL2785791 | 0.86 | — | — | |
| Lithium Ion SCHEMBL909415 | 0.86 | — | — | |
| Silver SCHEMBL5460379 | 0.86 | — | — | |
| SCHEMBL6695992 | 0.86 | — | — | |
| SCHEMBL7135981 | 0.86 | — | — | |
| SCHEMBL6620949 | 0.86 | — | — | |
| SCHEMBL11268942 | 0.86 | — | — | |
| SCHEMBL21906 | 0.86 | MEN1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8026200-B2 | Low pH mixtures for the removal of high density implanted resist | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-09-27 | — | — | US | claimed |
| EP-2288965-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | Advanced Technology Materials, Inc. (US) | 2011-03-02 | — | — | EP | claimed |
| US-20090281016-A1 | LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-12 | — | — | US | claimed |
| WO-2009135102-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-05 | — | — | WO | claimed |
| US-20080196626-A1 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | claimed |
| EP-2450412-A1 | Silicone coating composition | AZ Electronic Materials USA Corp. (US) | 2012-05-09 | — | — | EP | disclosed |
| US-8026040-B2 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| EP-2121857-A1 | SILICONE COATING COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | disclosed |
| WO-2008102256-A1 | SILICONE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| EP-0985664-B1 | Method of producing pyrrolidine derivatives | TORAY FINECHEMICALS CO LTD (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6479668-B1 | Method of producing pyrrolidine derivatives | TORAY INDUSTRIES, INC. (JP) | 2002-11-12 | — | — | US | disclosed |
| US-6130338-A | OXIDATING THE CORRESPONDING 3-PYRROLINE COMPOUND TO GIVE AN EPOXYPYRROLIDINE COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-0985664-A2 | Method of producing pyrrolidine derivatives | TORAY INDUSTRIES, INC. (JP) | 2000-03-15 | — | — | EP | disclosed |