SCHEMBL1507403

SCHEMBL1507403

CC(C)CCCCCCCCCCCCCN(CCCCCCCCCCCCCC(C)C)CCCCCCCCCCCCCC(C)C

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.48
KDM4C Q9H3R0 2/20 0.39
KDM4A O75164 1/20 0.39
PHF8 Q9UPP1 1/20 0.39
KDM2A Q9Y2K7 1/20 0.39
PLA2G1B P04054 1/20 0.38
PLA2G2A P14555 1/20 0.38
SIGMAR1 Q99720 1/20 0.35
ALDH1A1 P00352 2/20 0.33
TSHR P16473 1/20 0.33
HIF1A Q16665 1/20 0.33
EPAS1 Q99814 1/20 0.33
TRPV1 Q8NER1 1/20 0.31
TRPA1 O75762 1/20 0.31
BLM P54132 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1507499 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL139908 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL1507275 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL1507508 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL8464998 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL5189457 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL1507494 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL1020474 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL1507539 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL1507578 1.00 LMNA (0.48) LMNAKDM4CKDM4APHF8KDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7977029-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2011-07-12 US disclosed
EP-2296039-A1 Positive photosensitive composition Fujifilm Corporation (JP) 2011-03-16 EP disclosed
EP-2296040-A1 Positive photosensitive composition Fujifilm Corporation (JP) 2011-03-16 EP disclosed
US-7514201-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2009-04-07 US disclosed
US-20080318159-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-20070141513-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-06-21 US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed
US-20030186161-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2003-10-02 US disclosed
EP-1273970-A2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2003-01-08 EP disclosed