⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16589205 | 0.86 | — | — | |
| SCHEMBL47488 | 0.86 | HMGCR (0.34) | — | |
| SCHEMBL12216167 | 0.85 | — | — | |
| SCHEMBL2740787 | 0.84 | — | — | |
| SCHEMBL15078348 | 0.82 | — | — | |
| SCHEMBL15078349 | 0.82 | — | — | |
| SCHEMBL15078346 | 0.81 | — | — | |
| SCHEMBL13324967 | 0.78 | HMGCR (0.33) | — | |
| SCHEMBL13324972 | 0.78 | HMGCR (0.32) | — | |
| SCHEMBL16072436 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9152042-B2 | Acrylic ester derivative, high-molecular compound and photoresist composition | KURARAY CO., LTD. (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20130164675-A1 | ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2013-06-27 | — | — | US | disclosed |