Alcohol

Alcohol

SCHEMBL150777

C(OCC1CO1)C1CO1.CCO

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.58
TSHR P16473 5/20 0.54
MAPK1 P28482 1/20 0.54
ALDH1A1 P00352 10/20 0.54
TDP1 Q9NUW8 3/20 0.54
GLA P06280 1/20 0.41
TP53 P04637 4/20 0.38
CYP3A4 P08684 2/20 0.38
HIF1A Q16665 2/20 0.34
MAPT P10636 2/20 0.34
HPGD P15428 2/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
KMT2A Q03164 1/20 0.34
PPARG P37231 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alcohol SCHEMBL28231311 0.90 SMN1; SMN2 (0.65) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Propanol SCHEMBL1506634 0.90 SMN1; SMN2 (0.59) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
SCHEMBL27774448 0.89 TSHR (0.59) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Propane SCHEMBL29201 0.89 SMN1; SMN2 (0.62) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Methyl Alcohol SCHEMBL6913269 0.89 TSHR (0.59) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Di(Hydroxyethyl)Ether SCHEMBL20512331 0.89 SMN1; SMN2 (0.53) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Butane SCHEMBL5267062 0.88 SMN1; SMN2 (0.57) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Butane SCHEMBL150394 0.86 SMN1; SMN2 (0.67) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Propane SCHEMBL8349869 0.86 SMN1; SMN2 (0.60) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1
Ethylene Glycol SCHEMBL5448533 0.86 TSHR (0.56) SMN1; SMN2TSHRMAPK1ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2177 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118995085-A Composite binder, solid electrolyte film, electrode plate, solid battery and preparation method of solid battery 吉林大学 2024-11-22 CN claimed
CN-118325549-A Solvent-free spray adhesive and preparation method thereof 吉林成飞新材料有限公司 2024-07-12 CN claimed
CN-118307878-A Antibacterial master batch for BOPP film and preparation method thereof 苏州度辰新材料有限公司 2024-07-09 CN claimed
CN-118307965-A High-viscosity emulsified asphalt composition and preparation method thereof 东莞泰和沥青产品有限公司 2024-07-09 CN claimed
CN-118256128-A Intrinsic antibacterial powder coating composition and preparation method and application thereof 中国科学院宁波材料技术与工程研究所 2024-06-28 CN claimed
CN-118178324-A FAP alpha hydrolysis charge-turned liposome and composition, and preparation method and application thereof 锐康九域(厦门)医药科技有限公司 2024-06-14 CN claimed
US-20240191025-A1 NOVEL POLYETHERS ON THE BASIS OF 2,3-EPOXYBUTANE AND PROCESS FOR THE PREPARATION THEREOF EVONIK OPERATIONS GMBH (DE) 2024-06-13 US claimed
CN-118165415-A Anti-sticking master batch for BOPP film and preparation method thereof 苏州度辰新材料有限公司 2024-06-11 CN claimed
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN claimed
CN-115820081-B Preparation method of water-based super-hydrophobic epoxy resin and application of water-based super-hydrophobic epoxy resin in marine corrosion prevention 华南理工大学 2024-05-17 CN claimed
EP-0955795-A2 Conductive paste for filing via-hole, double-sided and multilayer printed circuit boards using the same, and method for producing the same Matsushita Electric Industrial Co., Ltd. (JP) 1999-11-10 EP claimed
EP-0349787-B1 An additive to metal cold rolling oil DAI ICHI KOGYO SEIYAKU CO LTD (JP) 1994-08-31 EP claimed
EP-0302941-B1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION NIPPON PAINT CO LTD (JP) 1993-12-29 EP claimed
US-5006623-A Good mechanical, electrical characteristics SHIN-ETSU CHEMICAL CO., LTD. (JP) 1991-04-09 US claimed
US-4999274-A Obtained by Reacting a Polyepoxide Compound, an Aromatic or Heterocyclic Carboxylic Acid Bearing a Phenolic Hydroxyl Group and a 1,2-Quinondiazido Sulfonyl Halide; Lithographic Plates, Photoresists NIPPON PAINT CO., LTD. (JP) 1991-03-12 US claimed
EP-0349787-A2 An additive to metal cold rolling oil DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 1990-01-10 EP claimed
US-4816539-A POLYHYDRIC ALCOHOL DIGLYCIDYL ETHER DIACRYLATE OR DIMETHACRYLATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1989-03-28 US claimed
EP-0302941-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION NIPPON PAINT CO., LTD. (JP) 1989-02-15 EP claimed
CN-87106228-A Controllable film-forming epoxy coating for cathodic electrocoating 1988-08-10 CN claimed
US-4212960-A Epoxy resin composition MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1980-07-15 US claimed