SCHEMBL15080746

SCHEMBL15080746

CCOCC1CC2CCC1(C)C2C

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
SLC6A3 Q01959 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15080752 0.78
SCHEMBL15080745 0.71
SCHEMBL11965856 0.63 CXCR3 (0.40)
SCHEMBL22739332 0.62
SCHEMBL15080751 0.61
SCHEMBL20388746 0.60 CYP2D6 (0.31) CYP2D6SLC6A2SLC6A4SLC6A3
SCHEMBL29306403 0.59 CYP2D6 (0.33) CYP2D6SLC6A2SLC6A4SLC6A3
SCHEMBL22893459 0.58
SCHEMBL5917746 0.58
SCHEMBL12424648 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8476401-B2 Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon MITSUBISHI RAYON CO., LTD. (JP) 2013-07-02 US disclosed