SCHEMBL15096046

SCHEMBL15096046

CCC(C)(C)OC(=O)NOCc1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 7/20 0.51
RAB9A P51151 7/20 0.51
KDM4E B2RXH2 1/20 0.43
MEN1 O00255 1/20 0.43
MAPT P10636 1/20 0.43
KMT2A Q03164 1/20 0.43
SYK P43405 1/20 0.42
RIPK1 Q13546 1/20 0.42
CTSK P43235 1/20 0.41
ALDH1A1 P00352 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HDAC3 O15379 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC10 Q969S8 1/20 0.41
HDAC11 Q96DB2 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
HDAC6 Q9UBN7 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL716007 0.86 NPC1 (0.56) NPC1RAB9ASYKCTSK
SCHEMBL17042179 0.83 NPC1 (0.53) NPC1RAB9ASYKALDH1A1SMN1; SMN2
SCHEMBL9571959 0.79 NPC1 (0.62) NPC1RAB9AALDH1A1SMN1; SMN2
SCHEMBL1349741 0.78 NPC1 (0.57) NPC1RAB9AKMT2AALDH1A1SMN1; SMN2
SCHEMBL32665608 0.77 NPC1 (0.53) NPC1RAB9AKDM4EMEN1MAPT
SCHEMBL28102925 0.76 NPC1 (0.56) NPC1RAB9AKDM4EMEN1MAPT
SCHEMBL18490885 0.76 PPARA (0.54) NPC1RAB9AMEN1KMT2ASYK
SCHEMBL8736454 0.76 NPC1 (0.55) NPC1RAB9AMAPTCTSKALDH1A1
SCHEMBL7122013 0.76 NPC1 (0.59) NPC1RAB9AALDH1A1SMN1; SMN2HDAC3
SCHEMBL29429363 0.75 NPC1 (0.62) NPC1RAB9AALDH1A1HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed