SCHEMBL15123780

SCHEMBL15123780

CC(C)(C)c1ccc(-c2cc(=O)cc(-c3ccc(C(C)(C)C)cc3)s2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKDC P78527 2/20 0.60
NPSR1 Q6W5P4 4/20 0.41
MAPK1 P28482 2/20 0.41
KIF11 P52732 3/20 0.41
KDM4E B2RXH2 5/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
JAK2 O60674 1/20 0.40
JAK1 P23458 1/20 0.40
TYK2 P29597 1/20 0.40
JAK3 P52333 1/20 0.40
MITF O75030 1/20 0.40
ALDH1A1 P00352 1/20 0.40
TP53 P04637 1/20 0.40
KMT2A Q03164 1/20 0.40
CRHBP P24387 2/20 0.39
CRHR2 Q13324 2/20 0.39
GFER P55789 1/20 0.39
NOTUM Q6P988 1/20 0.39
WRN Q14191 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5842319 0.81 PRKDC (0.48) PRKDCNPSR1MAPK1KDM4ENPC1
SCHEMBL19735284 0.81 APP (0.48) PRKDCKIF11KDM4ENPC1RAB9A
SCHEMBL5843601 0.77 PRKDC (1.00) PRKDC
SCHEMBL15929240 0.74 PRKDC (0.41) PRKDCNPSR1MAPK1KIF11KDM4E
SCHEMBL17994290 0.73 HSD17B1 (0.52) KIF11KDM4ENPC1RAB9AALDH1A1
SCHEMBL26325135 0.73 ESR1 (0.44) PRKDCKIF11KDM4ENPC1RAB9A
SCHEMBL14832718 0.73 PRKDC (0.40) PRKDCNPSR1MAPK1KIF11KDM4E
SCHEMBL7592699 0.73 PRKDC (0.45) PRKDCNPSR1KDM4ENPC1RAB9A
SCHEMBL12376257 0.72 FLT3 (0.46) PRKDCNPSR1MAPK1KDM4ENPC1
SCHEMBL27961812 0.72 POLB (0.46) PRKDCKIF11KDM4ENPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652718-B2 Resin composition, image-forming material, and image-forming method FUJI XEROX CO., LTD. (JP) 2014-02-18 US disclosed
US-20130189611-A1 RESIN COMPOSITION, IMAGE-FORMING MATERIAL, AND IMAGE-FORMING METHOD FUJI XEROX CO., LTD. (JP) 2013-07-25 US disclosed