SCHEMBL15214101

SCHEMBL15214101

CCC(C)C(=O)OC(C)(C)CCCC(=O)OC(C)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.33
ALDH1A1 P00352 1/20 0.31
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL824404 0.89 LMNA (0.33) LMNAALDH1A1CA1CA2
SCHEMBL15214100 0.88 LMNA (0.33) LMNAALDH1A1
SCHEMBL15214095 0.88 LMNA (0.33) LMNAALDH1A1
SCHEMBL15214088 0.83
SCHEMBL15214092 0.82 MAPT (0.32) CA1CA2
SCHEMBL824337 0.82 HTT (0.34) CA1CA2
SCHEMBL15214103 0.81 LMNA (0.33) LMNA
SCHEMBL13232010 0.80 MAPT (0.31)
SCHEMBL824401 0.77 LMNA (0.33) LMNAALDH1A1
SCHEMBL824380 0.77 LMNA (0.33) LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8518629-B2 Resist composition for immersion exposure and method of forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2013-08-27 US disclosed