⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14548547 | 0.92 | — | — | |
| SCHEMBL15214647 | 0.91 | HTT (0.31) | — | |
| SCHEMBL13180394 | 0.84 | — | — | |
| SCHEMBL13262521 | 0.83 | HTT (0.31) | — | |
| SCHEMBL10191367 | 0.83 | FGFR1 (0.33) | — | |
| SCHEMBL16131639 | 0.83 | — | — | |
| SCHEMBL14548678 | 0.81 | — | — | |
| SCHEMBL13180396 | 0.81 | — | — | |
| SCHEMBL13146696 | 0.81 | — | — | |
| SCHEMBL2611419 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8518629-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-27 | — | — | US | disclosed |