SCHEMBL15214647

SCHEMBL15214647

CCC(C)(C)CC(C)(C(=O)OC(C)(C)CC(=O)OCC(F)(F)F)C(C)(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13262521 0.92 HTT (0.31) HTT
SCHEMBL15214724 0.91
SCHEMBL14548547 0.83
SCHEMBL13180297 0.82 HTT (0.33) HTT
SCHEMBL10285000 0.82 HTT (0.38) HTT
SCHEMBL13760076 0.81 HTT (0.33) HTT
SCHEMBL14548675 0.81 HTT (0.33) HTT
SCHEMBL824324 0.81 HTT (0.35) HTT
SCHEMBL13262539 0.80 HTT (0.30) HTT
SCHEMBL13180294 0.80 HTT (0.30) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8518629-B2 Resist composition for immersion exposure and method of forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2013-08-27 US disclosed