SCHEMBL15216845

SCHEMBL15216845

COC(=O)OC1COC(=O)C1

nearest known ligand 0.38

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.38
HTT P42858 1/20 0.36
MAPT P10636 2/20 0.35
KDM4E B2RXH2 1/20 0.35
LMNA P02545 1/20 0.35
XPO1 O14980 1/20 0.33
CYP2D6 P10635 1/20 0.31
CYP1A2 P05177 1/20 0.31
HIF1A Q16665 1/20 0.31
MTNR1A P48039 2/20 0.31
CYP3A4 P08684 1/20 0.30
CYP2C19 P33261 1/20 0.30
THRB P10828 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22065357 0.81 CYP1A2 (0.33) CYP1A2HIF1ASMN1; SMN2
SCHEMBL4917217 0.81 PTPN1 (0.40) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL4926758 0.81 PTPN1 (0.40) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL5307393 0.81 PTPN1 (0.40) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL9925264 0.80 PTPN1 (0.37) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL12834881 0.77 PTPN1 (0.35) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL5898372 0.77 PTPN1 (0.40) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL5898366 0.77 PTPN1 (0.40) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL11988739 0.76 PTPN1 (0.40) PTPN1HTTMAPTKDM4ELMNA
SCHEMBL13817662 0.76 PTPN1 (0.37) PTPN1HTTMAPTKDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9223205-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-29 US disclosed
US-9122155-B2 Sulfonium salt, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-09-01 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130236832-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-09-12 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed