SCHEMBL15216848

SCHEMBL15216848

COC(=O)OCC(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OC

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
GLA P06280 1/20 0.35
HPGD P15428 1/20 0.35
HTT P42858 1/20 0.35
KMT2A Q03164 5/20 0.35
MEN1 O00255 2/20 0.35
CYP1A2 P05177 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32
NPC1 O15118 2/20 0.31
TP53 P04637 1/20 0.30
RAB9A P51151 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23974110 0.91 ALDH1A1 (0.34) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL17012586 0.91 ALDH1A1 (0.35) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL9924507 0.88 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL18714037 0.88 ALDH1A1 (0.34) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL19261164 0.87 ALDH1A1 (0.32) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL967507 0.87 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL92254 0.87 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL19215192 0.87 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL15216837 0.86 ALDH1A1 (0.34) ALDH1A1GLAHPGDHTTKMT2A
SCHEMBL12972094 0.85 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9223205-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-29 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130236832-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-09-12 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed