SCHEMBL15216888

SCHEMBL15216888

CCC(C)(C)C(=O)Oc1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ELANE P08246 13/20 0.43
KMT2A Q03164 1/20 0.33
STS P08842 1/20 0.33
PRTN3 P24158 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MGLL Q99685 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216265 0.88 ELANE (0.43) ELANEKMT2APRTN3L3MBTL1CA12
SCHEMBL15216266 0.87 ESR1 (0.37) ELANEKMT2A
SCHEMBL26506975 0.83 TSHR (0.32) MGLL
SCHEMBL18785300 0.83 MAPT (0.43) ELANEKMT2A
SCHEMBL10062506 0.82 ELANE (0.48) ELANEKMT2APRTN3L3MBTL1CA12
SCHEMBL16850010 0.81 ELANE (0.37) ELANEKMT2ASTSL3MBTL1MGLL
SCHEMBL18785843 0.80 TSHR (0.38) ELANEKMT2ASTSCA12CA1
SCHEMBL12216078 0.80 CA1 (0.47) ELANEKMT2ACA1CA2
SCHEMBL18785967 0.80 POLB (0.43) CA12CA1CA2CA7CA9
SCHEMBL17195514 0.80 CA1 (0.37) ELANEKMT2ACA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240215891-A1 Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
US-20240215890-A1 Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 US disclosed
US-20230324798-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-12 US disclosed
US-20230251573-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-10 US disclosed
US-20230251572-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-10 US disclosed
US-9778570-B2 Conductive polymer composition, coated article, patterning process and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-03 US disclosed
US-20160223909-A1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, PATTERNING PROCESS AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-04 US disclosed
US-8957160-B2 Preparation of polymer, resulting polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-17 US disclosed
US-20130224660-A1 PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed