SCHEMBL15219008

SCHEMBL15219008

CCCCS(=O)(=O)ON=C(C)c1cccc(C(C#N)=NOS(=O)(=O)CCCC)c1

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.34
PPARA Q07869 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.32
ALPL P05186 1/20 0.31
ALPI P09923 1/20 0.31
RAB9A P51151 3/20 0.31
NPC1 O15118 2/20 0.31
LMNA P02545 2/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPK1 P28482 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
KAT6A Q92794 1/20 0.30
SMPD1 P17405 3/20 0.30
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL46072 0.94 SMN1; SMN2 (0.35) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL3378884 0.94 SMN1; SMN2 (0.35) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL12923559 0.94 SMN1; SMN2 (0.35) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL18720502 0.94 SMN1; SMN2 (0.35) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL15500769 0.91 SMN1; SMN2 (0.33) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL14375149 0.89 SMN1; SMN2 (0.33) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL12310005 0.88 SMN1; SMN2 (0.32) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL13569215 0.88 NPC1 (0.34) SMN1; SMN2ALPLALPIRAB9ANPC1
SCHEMBL12616886 0.87 SMN1; SMN2 (0.32) SMN1; SMN2ALPLALPILMNAALDH1A1
SCHEMBL13758210 0.86 SMN1; SMN2 (0.31) SMN1; SMN2ALPLALPI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9250531-B2 Method of forming resist pattern and negative tone-development resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2016-02-02 US disclosed
US-8956801-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-02-17 US disclosed
US-20130224656-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-08-29 US disclosed