⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28415560 | 0.75 | LMNA (0.36) | — | |
| SCHEMBL9448501 | 0.73 | — | — | |
| SCHEMBL925982 | 0.73 | — | — | |
| SCHEMBL29045775 | 0.72 | — | — | |
| SCHEMBL28996315 | 0.72 | LMNA (0.32) | — | |
| SCHEMBL1132561 | 0.72 | — | — | |
| SCHEMBL8058125 | 0.71 | — | — | |
| SCHEMBL27032327 | 0.71 | — | — | |
| SCHEMBL32668879 | 0.71 | — | — | |
| SCHEMBL23563377 | 0.69 | MEN1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118562349-A | Sand-containing fog seal material and preparation method thereof | 杭州大江东城市设施管养有限公司 | 2024-08-30 | — | — | CN | disclosed |
| US-9897729-B2 | Photosensitive resin composition for color filter and application thereof | CHI MEI CORPORATION (TW) | 2018-02-20 | — | — | US | disclosed |
| US-20150315376-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2015-11-05 | — | — | US | disclosed |
| US-9062195-B2 | Red photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2015-06-23 | — | — | US | disclosed |
| US-20140343185-A1 | RED PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2014-11-20 | — | — | US | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |