SCHEMBL15399896

SCHEMBL15399896

ON(c1ccccc1)c1cccc2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 9/20 0.53
L3MBTL1 Q9Y468 1/20 0.43
CYP1A2 P05177 2/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
ALDH1A1 P00352 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
CYP2A6 P11509 1/20 0.39
TSHR P16473 1/20 0.39
HSD17B10 Q99714 1/20 0.39
KMT2A Q03164 1/20 0.38
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29553747 1.00 SIGMAR1 (0.53) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6
SCHEMBL4965222 0.87 SIGMAR1 (0.57) SIGMAR1L3MBTL1CYP1A2CYP3A4NR4A1
SCHEMBL20629037 0.85 SIGMAR1 (0.49) SIGMAR1L3MBTL1CYP1A2ALDH1A1CYP2A6
SCHEMBL21999281 0.81 SIGMAR1 (0.45) SIGMAR1L3MBTL1CYP1A2CYP2D6ALDH1A1
SCHEMBL18532161 0.78 SIGMAR1 (0.51) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6
SCHEMBL272955 0.78 SIGMAR1 (0.51) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6
SCHEMBL292397 0.78 SIGMAR1 (0.51) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6
SCHEMBL30799092 0.78 SIGMAR1 (0.51) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6
SCHEMBL29906514 0.78 SIGMAR1 (0.51) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6
Water SCHEMBL10786412 0.77 SIGMAR1 (0.50) SIGMAR1L3MBTL1CYP1A2CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9123689-B2 Epoxy resin composition, method for producing same, and semiconductor device using same TORAY INDUSTRIES, INC. (JP) 2015-09-01 US disclosed
US-20140005318-A1 EPOXY RESIN COMPOSITION, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE USING SAME TORAY INDUSTRIES, INC. (JP) 2014-01-02 US disclosed