Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 4/20 | 0.40 |
| ▸ | CA1 | P00915 | 3/20 | 0.39 |
| ▸ | MMP1 | P03956 | 2/20 | 0.39 |
| ▸ | MMP2 | P08253 | 2/20 | 0.39 |
| ▸ | MMP9 | P14780 | 2/20 | 0.39 |
| ▸ | MMP8 | P22894 | 2/20 | 0.39 |
| ▸ | MMP13 | P45452 | 2/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.35 |
| ▸ | F2 | P00734 | 2/20 | 0.34 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.34 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.34 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2128816 | 0.91 | CA2 (0.50) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL776311 | 0.87 | CA2 (0.43) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2125173 | 0.83 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2124886 | 0.79 | CA2 (0.50) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL11075743 | 0.78 | CA2 (0.44) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL774916 | 0.78 | CA2 (0.55) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL9335744 | 0.75 | CA2 (0.59) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL23504739 | 0.75 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL776245 | 0.72 | CA2 (0.44) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL177619 | 0.71 | CA1 (0.50) | CA2CA1CA7CA13F2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2469337-B1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-01-22 | — | — | EP | disclosed |
| CN-1975574-B | Radiation sensitive resin composition | SUMITOMO CHEMICAL CO | 2011-06-15 | — | — | CN | disclosed |
| CN-1975574-A | Radiation sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2007-06-06 | — | — | CN | disclosed |