SCHEMBL15436862

SCHEMBL15436862

CCC(C)(C)C(=O)NCc1cccc(CNC(=O)C(C)(C)CC)c1

nearest known ligand 0.78

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 4/20 0.78
PTGES O14684 1/20 0.46
ALDH1A1 P00352 2/20 0.46
HPGD P15428 1/20 0.46
MMP8 P22894 1/20 0.45
NR1H4 Q96RI1 1/20 0.44
POLB P06746 3/20 0.44
LMNA P02545 2/20 0.44
ESR1 P03372 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
OPRK1 P41145 2/20 0.43
MAPT P10636 2/20 0.43
PKM P14618 1/20 0.43
ALOX12 P18054 1/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15442032 0.95 RIPK1 (0.71) RIPK1PTGESALDH1A1HPGDMMP8
SCHEMBL18435145 0.94 RIPK1 (0.69) RIPK1PTGESALDH1A1HPGDMMP8
SCHEMBL17882307 0.89 RIPK1 (0.68) RIPK1HPGDMMP8LMNAMAPT
SCHEMBL17882306 0.89 RIPK1 (0.68) RIPK1ALDH1A1HPGDPOLBLMNA
SCHEMBL13296167 0.89 RIPK1 (0.68) RIPK1PTGESMMP8NR1H4POLB
SCHEMBL1709321 0.88 RIPK1 (1.00) RIPK1ALDH1A1MMP8LMNAOPRK1
SCHEMBL18697528 0.87 RIPK1 (0.61) RIPK1PTGESALDH1A1HPGDLMNA
SCHEMBL14229091 0.87 RIPK1 (0.64) RIPK1ALDH1A1HPGDPOLBLMNA
SCHEMBL27799289 0.87 RIPK1 (0.64) RIPK1HPGDLMNATDP1MEN1
SCHEMBL21335481 0.86 RIPK1 (0.58) RIPK1ALDH1A1HPGDMMP8NR1H4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10407582-B2 Ink composition, image forming method, and printed matter FUJIFILM CORPORATION (JP) 2019-09-10 US disclosed
US-20160359195-A1 SOLID ELECTROLYTE COMPOSITION, ELECTRODE SHEET FOR BATTERY AND ALL-SOLID-STATE SECONDARY BATTERY IN WHICH SOLID ELECTROLYTE COMPOSITION IS USED, AND METHOD FOR MANUFACTURING SOLID ELECTROLYTE COMPOSITION FUJIFILM CORPORATION (JP) 2016-12-08 US disclosed
US-20140022299-A1 INK COMPOSITION AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2014-01-23 US disclosed