Benzaldehyde

Benzaldehyde

SCHEMBL15512355

O=Cc1ccccc1.[La]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzaldehyde SCHEMBL1330097 0.97 — —
Benzaldehyde SCHEMBL22400699 0.97 ALDH1A1 (1.00) —
Benzaldehyde SCHEMBL10051945 0.97 — —
Benzaldehyde SCHEMBL573 0.97 — —
Benzaldehyde SCHEMBL896024 0.97 ALDH1A1 (1.00) —
Benzaldehyde SCHEMBL6061133 0.97 ALDH1A1 (1.00) —
Benzaldehyde SCHEMBL9236967 0.97 — —
Benzaldehyde SCHEMBL9455190 0.93 ALDH1A1 (0.93) —
Benzaldehyde SCHEMBL2064568 0.93 ALDH1A1 (0.93) —
Benzaldehyde SCHEMBL7160162 0.93 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116903835-A Polyester containing acetal structure and preparation method thereof 大连理工大学 2023-10-20 — — CN disclosed
US-20140072819-A1 COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, METHOD FOR FORMING THIN FILM AND THIN FILM FORMED USING THE SAME METHOD MITSUBISHI MATERIALS CORPORATION (JP) 2014-03-13 — — US disclosed
EP-2706049-A1 Composition for forming ferroelectric thin film, method for forming thin film and thin film formed using the same method Mitsubishi Materials Corporation (JP) 2014-03-12 — — EP disclosed
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