SCHEMBL1552789

SCHEMBL1552789

CC(N)(N)CN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5574 0.80
Hydrochloric Acid SCHEMBL3062035 0.76
Ammonia Solution, Strong SCHEMBL7741978 0.76
Methane SCHEMBL18173817 0.76
Iodide SCHEMBL7460413 0.76 CYP2D6 (0.50)
SCHEMBL23304291 0.76
SCHEMBL4284210 0.76
SCHEMBL117317 0.76
Hydrochloric Acid SCHEMBL7805756 0.76
SCHEMBL13327332 0.76 CYP2D6 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250188247-A1 DISSOLUTION AND DEPOLYMERIZATION OF PLASTICS U.S. DEPARTMENT OF ENERGY 2025-06-12 US claimed
CN-115368824-A Fast curing migration-free compositions based on organic polymers containing silane groups SIKA技术股份公司 2022-11-22 CN claimed
EP-3504355-A1 METHOD FOR DIRECTLY DEPOSITING PALLADIUM ONTO A NON-ACTIVATED SURFACE OF A GALLIUM NITRIDE SEMICONDUCTOR ATOTECH Deutschland GmbH (DE) 2019-07-03 EP claimed
US-4425238-A Removal of anionic compounds from water BASF AKTIENGESELLSCHAFT (DE) 1984-01-10 US claimed
US-20250188247-A1 DISSOLUTION AND DEPOLYMERIZATION OF PLASTICS U.S. DEPARTMENT OF ENERGY 2025-06-12 US disclosed
CN-117083366-A Lubricating oil composition 出光兴产株式会社 2023-11-17 CN disclosed
CN-116867881-A Lubricating oil composition 出光兴产株式会社 2023-10-10 CN disclosed
WO-2021241291-A1 RESIN COMPOSITION, METHOD FOR PRODUCING MODIFIED HYDROGENATED BLOCK COPOLYMER, AND MOLDED OBJECT 旭化成株式会社 2021-12-02 WO disclosed
EP-3504355-A1 METHOD FOR DIRECTLY DEPOSITING PALLADIUM ONTO A NON-ACTIVATED SURFACE OF A GALLIUM NITRIDE SEMICONDUCTOR ATOTECH Deutschland GmbH (DE) 2019-07-03 EP disclosed
EP-3380650-A1 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH Deutschland GmbH (DE) 2018-10-03 EP disclosed
EP-3380649-A1 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH Deutschland GmbH (DE) 2018-10-03 EP disclosed
EP-3234218-A2 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH Deutschland GmbH (DE) 2017-10-25 EP disclosed
US-5276161-A Catalytic hydrogenation of o-nitrophenylazohydroxyphenyl compounds; noble metal catalyst and organic amine CIBA-GEIGY CORPORATION (US) 1994-01-04 US disclosed
US-4999433-A Process for the preparation of benzotriazole derivatives CIBA-GEIGY CORPORATION (US) 1991-03-12 US disclosed
EP-0363318-A1 Process for the preparation of benzotriazole derivatives CIBA-GEIGY AG (CH) 1990-04-11 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed
US-4496719-A 3H-Indol-2-yl cationic hydrazone dyestuffs BAYER AKTIENGESELLSCHAFT (DE) 1985-01-29 US disclosed
US-4444959-A Water-soluble benzylated polyamidoamines BASF AKTIENGESELLSCHAFT (DE) 1984-04-24 US disclosed
US-4425238-A Removal of anionic compounds from water BASF AKTIENGESELLSCHAFT (DE) 1984-01-10 US disclosed
US-4383834-A IN THE PRESENCE OF A WATER SOLUBLE CATIONIC POLYELECTROLYTE BASF AKTIENGESELLSCHAFT (DE) 1983-05-17 US disclosed