Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CD81 | P60033 | 2/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.34 |
| ▸ | BACE1 | P56817 | 1/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.31 |
| ▸ | NOS3 | P29474 | 1/20 | 0.31 |
| ▸ | NOS1 | P29475 | 1/20 | 0.31 |
| ▸ | NOS2 | P35228 | 1/20 | 0.31 |
| ▸ | TBXAS1 | P24557 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | EP300 | Q09472 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6851328 | 0.98 | CD81 (0.38) | CD81PPARGBACE1PTGS1AKR1C3 | |
| SCHEMBL6851323 | 0.98 | CD81 (0.38) | CD81PPARGBACE1PTGS1AKR1C3 | |
| SCHEMBL1874983 | 0.92 | TSHR (0.40) | CD81PPARGBACE1 | |
| SCHEMBL303833 | 0.92 | CD81 (0.35) | CD81PPARGBACE1EP300 | |
| SCHEMBL6681757 | 0.92 | TSHR (0.40) | CD81PPARGBACE1 | |
| SCHEMBL30729595 | 0.91 | CD81 (0.37) | CD81PPARGBACE1 | |
| SCHEMBL3167528 | 0.90 | CD81 (0.34) | CD81PPARG | |
| SCHEMBL4577548 | 0.90 | ALDH1A1 (0.45) | CD81PPARG | |
| SCHEMBL21082716 | 0.90 | CD81 (0.34) | CD81PPARG | |
| SCHEMBL10923710 | 0.90 | CD81 (0.34) | CD81PPARG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2856258-B1 | PROCESS OF PRODUCTION OF A NANOPATTERNED ARTICLE USING NANOIMPRINT LITHOGRAPHY, NANOPATTERNED ARTICLE AND USES THEREOF | MICRO RESIST TECH GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH (DE) | 2021-01-06 | — | — | EP | disclosed |
| EP-2856258-A1 | COMPOSITION SUITABLE FOR USE AS A RELEASE-OPTIMIZED MATERIAL FOR NANOIMPRINT PROCESSES AND USES THEREOF | Micro Resist Technology Gesellschaft für chemische Materialien spezieller Photoresistsysteme mbH (DE) | 2015-04-08 | — | — | EP | disclosed |
| WO-2013174522-A1 | COMPOSITION SUITABLE FOR USE AS A RELEASE-OPTIMIZED MATERIAL FOR NANOIMPRINT PROCESSES AND USES THEREOF | MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH (DE) | 2013-11-28 | — | — | WO | disclosed |