SCHEMBL1553655

SCHEMBL1553655

CCCCCCCCCCCCCCCCCCOc1cc(OCCCCCCCCCCCCCCCCCC)c(N)cc1N

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50
TLR8 Q9NR97 3/20 0.49
TSHR P16473 1/20 0.49
MEN1 O00255 3/20 0.47
MAPT P10636 3/20 0.47
KMT2A Q03164 3/20 0.47
ALDH1A1 P00352 3/20 0.47
KDM4E B2RXH2 2/20 0.47
USP2 O75604 2/20 0.47
CASP1 P29466 2/20 0.47
TP53 P04637 1/20 0.47
POLB P06746 1/20 0.47
GAA P10253 1/20 0.47
HTT P42858 1/20 0.47
CASP7 P55210 1/20 0.47
ATM Q13315 1/20 0.47
MCHR1 Q99705 2/20 0.45
NR1I2 O75469 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1553128 1.00 CYP1A2 (0.50) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL1554235 1.00 CYP1A2 (0.50) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL1554055 1.00 CYP1A2 (0.50) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL1553685 1.00 CYP1A2 (0.50) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL1553131 1.00 CYP1A2 (0.50) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL11579460 0.94 CYP1A2 (0.52) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL19980862 0.90 MEN1 (0.55) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL4429554 0.89 ESR1 (0.44) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL11224164 0.89 SMPD1 (0.44) CYP1A2CYP2C9CYP2C19TLR8TSHR
SCHEMBL1979664 0.85 CYP1A2 (0.52) CYP1A2CYP2C9CYP2C19TLR8TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US claimed
EP-1329769-B1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2011-04-27 EP disclosed
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US disclosed
US-20040048188-A1 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-03-11 US disclosed
EP-1329769-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2003-07-23 EP disclosed