Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.53 |
| ▸ | LCK | P06239 | 1/20 | 0.47 |
| ▸ | FYN | P06241 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | APAF1 | O14727 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | CASP6 | P55212 | 1/20 | 0.43 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.43 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.43 |
| ▸ | CASP8 | Q14790 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | GFER | P55789 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5428749 | 0.85 | ALDH1A1 (0.62) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL10579632 | 0.83 | ALDH1A1 (0.51) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL10968443 | 0.83 | KDM4E (0.61) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL953480 | 0.81 | KDM4E (0.56) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL15845849 | 0.81 | ALDH1A1 (0.50) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL1319775 | 0.81 | HSD17B10 (0.54) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL15845864 | 0.81 | ALDH1A1 (0.50) | ALDH1A1LCKFYNKDM4EHPGD | |
| Bromide SCHEMBL14358987 | 0.80 | HSD17B10 (0.53) | ALDH1A1LCKFYNKDM4EHPGD | |
| SCHEMBL4997223 | 0.79 | KDM4E (0.56) | ALDH1A1KDM4EHPGDRECQLCASP6 | |
| SCHEMBL16411022 | 0.78 | ALDH1A1 (0.46) | ALDH1A1LCKFYNKDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-110537147-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-12 | — | — | CN | disclosed |
| WO-2024029475-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2024-02-08 | — | — | WO | disclosed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | disclosed |
| US-20040197699-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-20040048188-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-11 | — | — | US | disclosed |
| US-6677099-B1 | POLYAMIDEIMIDE DEVELOPED BY AN AQUEOUS ALKALINE SOLUTION AND WHICH IS EXCELLENT IN THE DEVELOPABILITY AND THE ADHESION TO A SUBSTRATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |
| EP-0424940-B1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5288588-A | Containing diamine substituted with phenolic hydroxyl, carboxyl, thiophenol and/or sulfonic groups | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1994-02-22 | — | — | US | disclosed |
| EP-0424940-A2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1991-05-02 | — | — | EP | disclosed |