SCHEMBL1557716

SCHEMBL1557716

Nc1cc(=O)[nH]c(=S)[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5447050 0.74
Methane SCHEMBL27740450 0.72 CA1 (0.48)
Methylthiouracil SCHEMBL159989 0.70
SCHEMBL11678739 0.70
SCHEMBL14941726 0.70
SCHEMBL12284066 0.70
SCHEMBL11736370 0.70
Methylthiouracil SCHEMBL5798462 0.68 SMN1; SMN2 (0.95)
Cyclopropane SCHEMBL27480802 0.68 CA1 (0.44)
SCHEMBL29955654 0.67 SMN1; SMN2 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116947419-A Cement stabilized macadam base and construction method thereof 辽宁中源建设发展有限公司 2023-10-27 CN claimed
CN-110813244-B Modified zirconium-based organic metal framework adsorbent for adsorbing lead ions and preparation method and application thereof 中山大学 2023-01-17 CN claimed
CN-110813244-A Modified zirconium-based organic metal framework adsorbent for adsorbing lead ions and preparation method and application thereof 中山大学 2020-02-21 CN claimed
US-10100054-B1 Pyrido[2,3-d]pyrimidines as anticancer agents KING SAUD UNIVERSITY (SA) 2018-10-16 US claimed
US-8841062-B2 Positive working photosensitive material AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2014-09-23 US claimed
US-20140154624-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-06-05 US claimed
US-7001940-B2 Use of substituted biaromatic β-diketone as stabilizing agent of halogenated polymers and resulting polymer RHODIA CHIMIE (FR) 2006-02-21 US claimed
US-20040097626-A1 Use of substituted biaromatic beta-diketone as stabilising agent of halogenated polymers and resulting polymer RHODIA CHIMIE (FR) 2004-05-20 US claimed
EP-0041479-B1 CHLORINE-CONTAINING THERMOPLASTIC POLYMERS STABILIZED WITH AMINO-THIOURACILS CIBA-GEIGY AG (CH) 1984-04-04 EP claimed
US-4352903-A HEAT RESISTANT MOLDING MATERIALS CIBA-GEIGY CORPORATION (US) 1982-10-05 US claimed
EP-0041479-A1 Chlorine-containing thermoplastic polymers stabilized with amino-thiouracils CIBA-GEIGY AG (CH) 1981-12-09 EP claimed
US-4196073-A Hydrophilic thio compounds as selective depressants in the flotation separation of copper and molybdenum CANADIAN INDUSTRIES LIMITED (CA) 1980-04-01 US claimed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US claimed
JP-61223070-A None JP disclosed
US-12619149-B2 DNQ-free chemically amplified resist composition MERCK PATENT GMBH (DE) 2026-05-05 US disclosed
US-12393115-B2 Positive working photosensitive material MERCK PATENT GMBH (DE) 2025-08-19 US disclosed
EP-0041479-A1 Chlorine-containing thermoplastic polymers stabilized with amino-thiouracils CIBA-GEIGY AG (CH) 1981-12-09 EP disclosed
US-4196073-A Hydrophilic thio compounds as selective depressants in the flotation separation of copper and molybdenum CANADIAN INDUSTRIES LIMITED (CA) 1980-04-01 US disclosed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US disclosed
US-3993661-A Quinone methide photograhpic reagent precursors POLAROID CORPORATION (US) 1976-11-23 US disclosed